Electrodeposited Co-Cu/Cu multilayered microposts

X-ray lithography and electrodeposition were combined to deposit an array of Co-Cu/Cu multilayer microposts of 500 mu m tall into deep recesses for novel giant magnetoresistance (GMR) architectures. A citrate-boric acid electrolyte was used with pulsed potential. The applied potential was determined through inspection of the polarization curve from linear sweep voltammetry, and scanning electron microscopy (SEM)/transmission electron microscope (TEM) confirmed the micropost layered structure. Room temperature magnetoresistance was reported for different bilayer sizes of the micropost, and up to 4% current perpendicular-to-plane giant magnetoresistance (CPP-GMR) with saturation values less than 1 T was observed. (C) 2008 Elsevier B.V. All rights reserved.