Photoluminescence of InAs self-organized quantum dots on (001)InP substrate with GaAs interlayer

被引:2
|
作者
Wang, XQ
Du, GT
Yin, JH
Li, M
Li, MT
Qu, Y
Bo, BX
Yang, SR [1 ]
机构
[1] Jilin Univ, State Key Lab Integrated Optoelect, Dept Elect & Engn, Changchun 130023, Peoples R China
[2] Changchun Inst Opt & Fine Mech, Natl Key Lab High Power Semicond Lasers, Changchun 130022, Peoples R China
基金
中国国家自然科学基金;
关键词
photoluminescence; metalorganic chemical vapor deposition; semiconducting III-V materials;
D O I
10.1016/S0022-0248(01)01795-X
中图分类号
O7 [晶体学];
学科分类号
0702 ; 070205 ; 0703 ; 080501 ;
摘要
In this paper, InAs self-organized quantum dots (QDs) were deposited on (0 0 1)InP substrate with and without a GaAs interlayer by low pressure metalorganic chemical vapor deposition. An atomic force microscope image showed that InAs QDs arranged regularly on the GaAs interlayer. Comparison between photoluminescence (PL) spectra of InAs QDs with and without GaAs interlayer indicated that larger area density and much narrower size distribution of InAs QDs were obtained by inserting the GaAs interlayer. The area density of InAs QDs increased while the size distribution hardly changed when the thickness of InAs increased from 2.5 to 4 ML (monolayer). However, when the thickness of InAs increased to 6 ML, the mean size of InAs QDs increased while the area density of InAs QDs decreased because of the coalescence of QDs. PL spectra with different thickness of GaAs interlayer indicated that the largest density of InAs QDs could be obtained when the thickness of GaAs interlayer was 3 nm. (C) 2002 Elsevier Science B.V. All rights reserved.
引用
收藏
页码:60 / 64
页数:5
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