Energetic ion and neutral energy analyzer for extreme-ultraviolet light sources

被引：1
|
作者：
Andruczyk, Daniel [1 ]
Sporre, John [1 ]
Elg, Dan [1 ]
Cho, Tae [1 ]
Ruzic, David N. [1 ]
机构：
[1] Univ Illinois, Ctr Plasma Mat Interact, Talbot Lab 213, Urbana, IL 61801 USA
来源：
EXTREME ULTRAVIOLET (EUV) LITHOGRAPHY III | 2012年 / 8322卷
关键词：
Actinic; debris mitigation; EUV lithography;
D O I：
10.1117/12.916437
中图分类号：
O43 [光学];
学科分类号：
070207 ; 0803 ;
摘要：
The Center for Plasma-Material Interactions has developed a detector capable of diagnosing the energetic ion and neutral spectrums emanating from extreme ultraviolet light sources. This tool has been used in the past for high-power output sources, but it is readily evident that actinic inspections tools require the use of debris mitigation analyzers. Using this tool, manufacturers can optimize the use of debris mitigation techniques, as well as analyze the effects brightness increases have on tool lifetime.
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页数：14
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