Supplementary zones-surrounded Fresnel zone plate with enhanced optical resolution

被引:1
|
作者
Lee, Yen-Min [1 ]
Chen, Szu-Hung [2 ]
Hsu, Chen-Pin [3 ]
Chiou, Pei-Chuen [1 ]
Tsai, Kuen-Yu [4 ]
Chung, Tien-Tung [5 ]
Tsai, Cheng-Han [1 ]
Liu, Zhan-Yu [1 ]
Li, Jia-Han [1 ]
机构
[1] Natl Taiwan Univ, Dept Engn Sci & Ocean Engn, Taipei 10617, Taiwan
[2] Natl Appl Res Labs NARLabs, Natl Nano Device Labs NDL, Hsinchu 30078, Taiwan
[3] Natl Tsing Hua Univ, Inst Nanoengn & Microsyst, Hsinchu 30013, Taiwan
[4] Natl Taiwan Univ, Dept Elect Engn, Taipei 10617, Taiwan
[5] Natl Taiwan Univ, Dept Mech Engn, Taipei 10617, Taiwan
关键词
Fresnel zone plate; diffractive optics; extreme ultraviolet; X-RAY MICROSCOPY; FABRICATION; LITHOGRAPHY; DIFFRACTION;
D O I
10.1088/2040-8978/17/8/085608
中图分类号
O43 [光学];
学科分类号
070207 ; 0803 ;
摘要
The supplementary zones surrounding an ordinary Fresnel zone plate (FZP) are utilized to improve the optical resolution at focus. Based on the Fresnel-Kirchhoff diffraction formula, an optimization model is used to design the supplementary zones-surrounded FZP (SZFZP). We justified this optimization model by comparing the numerical simulations and experimental measurements in the visible light region. As expected, the comparison shows a good fit between the simulation and measurement. Mostly, both results showed that the optical resolution and the focal intensity in the visible light region are improved by applying the optimized SZFZP. Afterwards, this model is used to design the SZFZP for applications in extreme ultraviolet (EUV) light. At this point, we demonstrated the ability to fabricate the optimized SZFZP in the EUV region. In addition, we simulated the focusing properties for the designed SZFZP. Consequently, the numerical results for EUV light focused by the designed SZFZP exhibited better performances in optical resolution and intensity.
引用
收藏
页数:8
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