Goos-Hanchen shift at the surface of chiral negative refractive media

被引：0
|
作者：
Dong, W. T. [1 ]
Gao, L. [1 ]
Qiu, C. W. [2 ]
机构：
[1] Suzhou Univ, Dept Phys, Jiangsu Key Lab Thin Films, Suzhou 215006, Peoples R China
[2] Natl Univ Singapore, Singapore 119260, Singapore
来源：
PROCEEDINGS OF THE 2008 INTERNATIONAL WORKSHOP ON METAMATERIALS | 2008年
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中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
The Goos-Hachen (GH) shift at the surface of chiral negative refraction media is analyzed theoretically. GH shifts are observed for both components of the reflected field near the respective critical angles. It is found that the shifts for both components of the reflected field are always positive when angles of incidence are larger than the second critical angle.
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页码：77 / +
页数：2
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