Electron beam evaporation of boron at forevacuum pressures for plasma-assisted deposition of boron-containing coatings

被引：19
|
作者：
Yushkov, Yu. G. [1 ,2 ]
Tyunkov, A. V. [1 ,2 ]
Oks, E. M. [1 ,2 ]
Zolotukhin, D. B. [1 ]
机构：
[1] Tomsk State Univ Control Syst & Radioelect, Tomsk 634050, Russia
[2] Russian Acad Sci, Inst High Current Elect, Tomsk 634055, Russia
来源：
JOURNAL OF APPLIED PHYSICS | 2016年 / 120卷 / 23期
基金：
俄罗斯科学基金会;
关键词：
FILMS; IRRADIATION; RANGE; ARC;
D O I：
10.1063/1.4972268
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
We describe the use of a plasma-cathode electron source for electron beam evaporation of boron at forevacuum pressures (similar to 10 Pa) with subsequent deposition of boron-containing coatings on a titanium substrate. We analyze the process of electron beam heating and evaporation of boron, study the mass-to-charge composition of the gas and boron beam-produced plasma, apply such plasma for coating deposition, and investigate the elemental composition of the deposited film and its microhardness. Published by AIP Publishing.
引用
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页数：5
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