A subthreshold surface potential model for short-channel MOSFET taking into account the varying depth of channel depletion layer due to source and drain junctions

被引:38
|
作者
Baishya, S [1 ]
Mallik, A
Sarkar, CK
机构
[1] Jadavpur Univ, Dept Elect & Telecommun Engn, Kolkata 700032, W Bengal, India
[2] Kalyani Govt Engn Coll, Dept Elect & Commun Engn, Kalyani 741235, W Bengal, India
关键词
depletion layer depth; drain-induced barrier lowering (DIBL); subthreshold; surface potential;
D O I
10.1109/TED.2005.864364
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
An analytical subthreshold surface potential model for short-channel MOSFET is presented. In this model, the effect of varying depth of the channel depletion layer on the surface potential has been considered. The effect of the depletion layers around the source and drain junctions on the surface potential, which is very important for short channel devices is included in this model. With this, the drawback of the existing models that assume a constant channel depletion layer thickness is removed resulting in a more accurate prediction of the surface potential. A pseudo-two-dimensional method is adopted to retain the accuracy of two-dimensional analysis yet resulting in a simpler manageable one-dimensional analytical expression. The subthreshold drain current is also evaluated utilizing this surface potential model.
引用
收藏
页码:507 / 514
页数:8
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