Raman microscopy of lateral epitaxial overgrowth of GaN on sapphire

被引:47
|
作者
Pophristic, M
Long, FH
Schurman, M
Ramer, J
Ferguson, IT
机构
[1] Rutgers State Univ, Dept Chem, Piscataway, NJ 08854 USA
[2] EMCORE Corp, Somerset, NJ 08873 USA
关键词
D O I
10.1063/1.124136
中图分类号
O59 [应用物理学];
学科分类号
摘要
We have used confocal Raman microscopy to investigate lateral epitaxially overgrown (LEO) GaN on sapphire substrates. The one-phonon Raman spectra are consistent with pyramidal growth of the GaN before coalescence has occurred. The position and asymmetric line shape of the A(1) longitudinal optical (LO) phonon demonstrate that the LEO GaN is doped. The dopant is most likely Si from the SiN mask used to produce the LEO GaN. The carrier concentration is estimated to be 1 x 10(17) cm(-3). We have also used Raman microscopy to spatially resolve the yellow emission from different regions of the LEO GaN. (C) 1999 American Institute of Physics. [S0003-6951(99)02123-3].
引用
收藏
页码:3519 / 3521
页数:3
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