Comparative study on the oxidation resistance between Ti-Al-Si-N and Ti-Al-N coatings

被引：7
|
作者：
Kim, Jung Wook [1 ]
Abraham, Sudeep [1 ]
Kim, Kwang Ho [1 ]
Sung, Jang Hyun [2 ]
Moore, John. J. [3 ]
机构：
[1] Pusan Natl Univ, Div Mat Sci & Engn, Pusan 609735, South Korea
[2] Dong A Univ, Dept Met & Mat Sci, Busan 604714, South Korea
[3] Colorado Sch Mines, Dept Met & Mat Engn, Golden, CO 80401 USA
来源：
HEAT TREATMENT OF MATERIALS | 2006年 / 118卷
关键词：
oxidation; Ti-Al-Si-N; Ti-Al-N; Al2O3; layer; SiO2;
D O I：
10.4028/www.scientific.net/SSP.118.317
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
High-temperature oxidation behaviors of Ti-Al-Si-N and Ti-Al-N films were comparatively investigated in this work. Two kinds of Ti0.75Al0.25N and Ti0.69Al0.23Si0.08N films were deposited on WC-Co substrates by a DC magnetron sputtering method using separate Ti3Al(99.9%) and Si(99.99%) targets in a gaseous mixture of Ar and N-2. Si addition of 8 at.% into Ti-Al-N film modified its microstructure to a fine composite comprising, Ti-Al-N crystallites and amorphous Si3N4, and to a smoother surface morphology. While the solid solution Ti0.75Al0.25N film had superior oxidation resistance up to around 700 degrees C, the composite Ti-Al-Si-N film showed further enhanced oxidation resistance. Both Al2O3 and SiO2 layers played roles as a barrier against oxygen diffusion for the quaternary Ti-Al-Si-N film, whereas only the Al2O3 oxide layer formed at surface did a role for the Ti-Al-N film. Oxidation behavior and mechanical stability of the films after oxidation were compared between two films using instrumental analyses such as XRD, GDOES, XPS, and scratch test.
引用
收藏
页码：317 / +
页数：3
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