Thermal annealing of metal-semiconductor contact for CZT detectors

被引:1
|
作者
Park, S. H. [1 ]
Ha, J. H. [1 ]
Lee, J. H. [1 ]
Kim, H. S. [1 ]
Kim, Y. K. [2 ]
机构
[1] Korea Atom Energy Res Inst, 1045 Daedeokdaero, Taejon 305353, South Korea
[2] Hanyang Univ, Dept Nucl Engn, Seoul 133791, South Korea
关键词
D O I
10.1109/NSSMIC.2007.4437288
中图分类号
O59 [应用物理学];
学科分类号
摘要
CZT can be used for high-resolution X-ray and y - ray spectroscopy at room temperature. Previously thermal annealing process has been studied to decrease the leakage current of the detector and obtain the stable detector performance. Because of its low work function, indium can be used as the metal contact for CZT Schottky detector. The low temperature annealing effect on In/CZT contact was studied in our work. A CZT Schottky detector with indium/CZT/gold structure was fabricated. The leakage current and the energy resolution of each detector were measured. The detector was annealed for 10 hours in vacuum, and for 2, 4, 8 hours in air. The leakage current and the energy resolution of the detector were measured after the annealing process and they were compared with the data before the annealing. It was found that the detector performance of CZT Schottky detector was enhanced with the low temperature annealing process in air.
引用
收藏
页码:1521 / +
页数:2
相关论文
共 50 条
  • [31] SPECIFIC CONTACT RESISTANCE OF METAL-SEMICONDUCTOR BARRIERS
    CHANG, CY
    FANG, YK
    SZE, SM
    SOLID-STATE ELECTRONICS, 1971, 14 (07) : 541 - &
  • [32] ISSUES IN METAL-SEMICONDUCTOR CONTACT DESIGN AND IMPLEMENTATION
    NICOLET, MA
    KOLAWA, E
    MOLARIUS, J
    SOLAR CELLS, 1989, 27 (1-4): : 177 - 189
  • [33] Study of the metal-semiconductor contact to ZnO films
    Yan, Yu
    Mi, Wei
    Zhao, Jinshi
    Yang, Zhengchun
    Zhang, Kailiang
    Luan, Chongbiao
    VACUUM, 2018, 155 : 210 - 213
  • [34] THE THEORY OF RECTIFICATION AND INJECTION AT A METAL-SEMICONDUCTOR CONTACT
    GUNN, JB
    PROCEEDINGS OF THE PHYSICAL SOCIETY OF LONDON SECTION B, 1954, 67 (415): : 575 - 581
  • [35] SPECIFIC CONTACT RESISTANCE OF METAL-SEMICONDUCTOR OHMIC CONTACT.
    Chen, Cunli
    Pan Tao Ti Hsueh Pao/Chinese Journal of Semiconductors, 1983, 4 (02): : 191 - 193
  • [36] PARAMETER STABILIZATION OF THE METAL-SEMICONDUCTOR CONTACTS IN THE ANNEALING PROCESS
    PASHAYEV, AM
    ADJALOV, AR
    ASLANOV, TA
    IZVESTIYA AKADEMII NAUK AZERBAIDZHANSKOI SSR SERIYA FIZIKO-TEKHNICHESKIKH I MATEMATICHESKIKH NAUK, 1983, 4 (05): : 81 - 82
  • [37] Contact resistivities of metal-insulator-semiconductor contacts and metal-semiconductor contacts
    Yu, Hao
    Schaekers, Marc
    Barla, Kathy
    Horiguchi, Naoto
    Collaert, Nadine
    Thean, Aaron Voon-Yew
    De Meyer, Kristin
    APPLIED PHYSICS LETTERS, 2016, 108 (17)
  • [39] Effect of metal contact size on the metal-semiconductor junction characteristics
    Patole, Shashikant P.
    Ali, Ahmed
    Alkindi, Fatmah
    Rezeq, Moh'd
    2018 IEEE 18TH INTERNATIONAL CONFERENCE ON NANOTECHNOLOGY (IEEE-NANO), 2018,
  • [40] A Comparison of Layered Metal-Semiconductor Optical Position Sensitive Detectors
    Henry, Jasmine
    Livingstone, John
    IEEE SENSORS JOURNAL, 2002, 2 (04) : 372 - 376