Amino-containing polymers for water soluble electron-beam resist.

被引：0
|
作者：
Nagasaki, Y [1 ]
Sato, Y [1 ]
Kato, M [1 ]
机构：
[1] Sci Univ Tokyo, Dept Mat Sci, Noda, Chiba 2788510, Japan
来源：
ABSTRACTS OF PAPERS OF THE AMERICAN CHEMICAL SOCIETY | 1999年 / 218卷
关键词：
D O I：
暂无
中图分类号：
O6 [化学];
学科分类号：
0703 ;
摘要：
47-PMSE
引用
收藏
页码：U616 / U616
页数：1
相关论文
共 50 条
  • [1] Poly(siloxyethylene glycol) as a new water soluble electron-beam resist.
    Nagasaki, Y
    Kato, M
    Aoki, H
    ABSTRACTS OF PAPERS OF THE AMERICAN CHEMICAL SOCIETY, 1998, 215 : U396 - U396
  • [2] A new silicon-containing polymer for electron-beam resist.
    Nagasaki, Y
    Kimura, H
    Kato, M
    ABSTRACTS OF PAPERS OF THE AMERICAN CHEMICAL SOCIETY, 1997, 214 : 315 - PMSE
  • [3] Photocatalytic activity of water-soluble tetrapyrrole compounds in the presence of amino-containing polymers
    N. N. Glagolev
    S. Z. Rogovina
    A. B. Solov’eva
    N. A. Aksenova
    S. L. Kotova
    Russian Journal of Physical Chemistry, 2006, 80 : S72 - S76
  • [4] Effect of amino-containing polymers on the photocatalytic activity of water-soluble porphyrin sensitizers
    N. N. Glagolev
    N. A. Aksenova
    S. Z. Rogovina
    A. B. Solov’eva
    Doklady Chemistry, 2007, 416 : 205 - 206
  • [5] Photocatalytic activity of water-soluble tetrapyrrole compounds in the presence of amino-containing polymers
    Glagolev, N. N.
    Rogovina, S. Z.
    Solov'eva, A. B.
    Aksenova, N. A.
    Kotova, S. L.
    RUSSIAN JOURNAL OF PHYSICAL CHEMISTRY, 2006, 80 (Suppl 1): : S72 - S76
  • [6] Effect of amino-containing polymers on the photocatalytic activity of water-soluble porphyrin sensitizers
    Glagolev, N. N.
    Aksenova, N. A.
    Rogovina, S. Z.
    Solov'eva, A. B.
    DOKLADY CHEMISTRY, 2007, 416 (1) : 205 - 206
  • [7] WATER DEVELOPABLE PHOTO/ELECTRON RESIST.
    LaBar, R.A.
    IBM technical disclosure bulletin, 1983, 25 (12): : 6589 - 6590
  • [8] NEW SILICON CONTAINING ELECTRON-BEAM RESIST SYSTEMS
    REICHMANIS, E
    NOVEMBRE, A
    TARASCON, R
    SHUGARD, A
    ABSTRACTS OF PAPERS OF THE AMERICAN CHEMICAL SOCIETY, 1986, 192 : 63 - PMSE
  • [9] NEW SILICON-CONTAINING ELECTRON-BEAM RESIST SYSTEMS
    REICHMANIS, E
    NOVEMBRE, AE
    TARASCON, RG
    SHUGARD, A
    ACS SYMPOSIUM SERIES, 1987, 346 : 110 - 121
  • [10] SYNTHESIS, RADIATION DEGRADATION, AND ELECTRON-BEAM RESIST BEHAVIOR OF FLUORINE-CONTAINING VINYL-POLYMERS
    PITTMAN, CU
    UEDA, M
    CHEN, CY
    KWIATKOWSKI, JH
    COOK, CF
    HELBERT, JN
    JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1981, 128 (08) : 1758 - 1762
12345