Lattice strain and tilt mapping in stressed Ge microstructures using X-ray Laue micro-diffraction and rainbow filtering

被引：17

作者：

Tardif, Samuel ^{[1
,2
]}

Gassenq, Alban ^{[1
,3
]}

Guilloy, Kevin ^{[1
,3
]}

Pauc, Nicolas ^{[1
,3
]}

Dias, Guilherme Osvaldo ^{[1
,4
]}

Hartmann, Jean-Michel ^{[1
,4
]}

Widiez, Julie ^{[1
,4
]}

Zabel, Thomas ^{[5
]}

Marin, Esteban ^{[5
]}

Sigg, Hans ^{[5
]}

Faist, Jerome ^{[6
]}

Chelnokov, Alexei ^{[1
,4
]}

Reboud, Vincent ^{[1
,4
]}

Calvo, Vincent ^{[1
,3
]}

Micha, Jean-Sebastien ^{[1
,2
,7
]}

Robach, Odile ^{[1
,2
]}

Rieutord, Francois ^{[1
,2
]}

机构：

[1] Univ Grenoble Alpes, F-38000 Grenoble, France

[2] CEA, INAC, MEM, 17 Rue Martyrs, F-38000 Grenoble, France

[3] CEA, INAC, PHELIQS, 17 Rue Martyrs, F-38000 Grenoble, France

[4] CEA, LETI, Minatec Campus,17 Rue Martyrs, F-38054 Grenoble, France

[5] Paul Scherrer Inst, Lab Micro & Nanotechnol, CH-5232 Villigen, Switzerland

[6] Swiss Fed Inst Technol, Inst Quantum Elect, CH-8093 Zurich, Switzerland

[7] CNRS, 17 Rue Martyrs, F-38000 Grenoble, France

来源：

JOURNAL OF APPLIED CRYSTALLOGRAPHY | 2016年 / 49卷

基金：

瑞士国家科学基金会;

关键词：

Laue micro-diffraction; rainbow-filtered micro-diffraction; strain mapping; Ge micro-devices; WHITE-BEAM; GRAIN-ORIENTATION; ELASTIC STRAIN; THIN-FILMS; MICRODIFFRACTION; GERMANIUM; SILICON; DISLOCATION; NANOMEMBRANES; SPECTROSCOPY;

D O I：

10.1107/S1600576716010347

中图分类号：

O6 [化学];

学科分类号：

0703 ;

摘要：

Laue micro-diffraction and simultaneous rainbow-filtered micro-diffraction were used to measure accurately the full strain tensor and the lattice orientation distribution at the sub-micrometre scale in highly strained, suspended Ge micro-devices. A numerical approach to obtain the full strain tensor from the deviatoric strain measurement alone is also demonstrated and used for faster full strain mapping. The measurements were performed in a series of micro-devices under either uniaxial or biaxial stress and an excellent agreement with numerical simulations was found. This shows the superior potential of Laue micro-diffraction for the investigation of highly strained micro-devices.

引用

页码：1402 / 1411

页数：10

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[1] Lattice strain and tilt mapping in stressed Ge microstructures using X-ray Laue micro-diffraction and rainbow filtering
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Gassenq, Alban
Guilloy, Kevin
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Osvaldo Dias, Guilherme
Hartmann, Jean-Michel
Widiez, Julie
Zabel, Thomas
Marin, Esteban
Sigg, Hans
Faist, Jérôme
Chelnokov, Alexei
Reboud, Vincent
Calvo, Vincent
Micha, Jean-Sébastien
Robach, Odile
Rieutord, François
[J]. Journal of Applied Crystallography, 2016, 49 : 1402 - 1411
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