Doubly charged negative silicon-carbon clusters produced in sputtering

被引:36
|
作者
Gnaser, H [1 ]
机构
[1] Univ Kaiserslautern, Fachbereich Phys, D-67663 Kaiserslautern, Germany
[2] Univ Kaiserslautern, Inst Oberflachen & Schichtanalyt, D-67663 Kaiserslautern, Germany
来源
PHYSICAL REVIEW A | 1999年 / 60卷 / 04期
关键词
D O I
10.1103/PhysRevA.60.R2645
中图分类号
O43 [光学];
学科分类号
070207 ; 0803 ;
摘要
Small doubly charged negative cluster ions SiCn2- (with n = 6, 8, and 10) are produced by sputtering the surface of a SiC specimen with a 14.5-keV Cs+-ion beam. They are detected in a double-focusing mass spectrometer that covers a dynamic abundance range of about 10(9). The emission yields of these dianionic clusters amount to roughly 10(-4) of the corresponding singly charged cluster ions. For both types of ion species, the abundance distributions decrease monotonically with an increasing number of C atoms in the cluster. This observation is ascribed to fragmentation processes that are due to the high amount of internal energy relayed to the cluster species in the sputtering event. Apart from this decomposition caused by excitation, the flight time through the mass spectrometer of similar to 15 mu s establishes a lower limit with respect to the intrinsic lifetimes of both the singly and doubly charged ions. [S1050-2947(99)50510-6].
引用
收藏
页码:R2645 / R2648
页数:4
相关论文
共 50 条
  • [21] Persistent Planar Tetracoordinate Carbon in Global Minima Structures of Silicon-Carbon Clusters
    Leyva-Parra, Luis
    Inostroza, Diego
    Yanez, Osvaldo
    Cesar Cruz, Julio
    Garza, Jorge
    Garcia, Victor
    Tiznado, William
    ATOMS, 2022, 10 (01)
  • [22] Singly- and doubly-negative carbon clusters in sputtering: Energy spectra, abundance distributions and unimolecular fragmentation
    Gnaser, H
    NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 1999, 149 (1-2): : 38 - 52
  • [23] DOUBLY CHARGED ION CLUSTERS
    SHUKLA, AK
    MOORE, C
    STACE, AJ
    CHEMICAL PHYSICS LETTERS, 1984, 109 (04) : 324 - 326
  • [24] DOUBLY CHARGED NEGATIVE-IONS OF CARBON-60
    HETTICH, RL
    COMPTON, RN
    RITCHIE, RH
    PHYSICAL REVIEW LETTERS, 1991, 67 (10) : 1242 - 1245
  • [25] DOUBLY CHARGED NEGATIVE IONS
    FREMLIN, JH
    NATURE, 1966, 212 (5069) : 1453 - &
  • [26] Nanostructure of silicon-carbon composite thin films obtained using magnetron sputtering technique
    Kupriyanov L.Y.
    Roginskaya Y.E.
    Kozlova N.V.
    Politova E.D.
    Kal'nov V.A.
    Zhikharev E.N.
    Nanotechnologies in Russia, 2011, 6 (9-10): : 633 - 638
  • [27] Formation of molecular doubly charged anions in sputtering
    Gnaser, H
    NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 2003, 212 : 407 - 413
  • [28] SILICON-CARBON TREATMENT OUT OF INORGANIC IMPURITIES PRODUCED FROM THE RICE HUSK
    Sukharnikov, Y., I
    Bunchuk, L., V
    Anarbekov, K. K.
    Kablanbekov, A. A.
    KOMPLEKSNOE ISPOLZOVANIE MINERALNOGO SYRA, 2019, (02): : 61 - 67
  • [29] PHYSICAL-PROPERTIES OF AMORPHOUS SILICON-CARBON ALLOYS PRODUCED BY DIFFERENT TECHNIQUES
    CARBONE, A
    DEMICHELIS, F
    KANIADAKIS, G
    DELLAMEA, G
    FREIRE, F
    RAVA, P
    JOURNAL OF MATERIALS RESEARCH, 1990, 5 (12) : 2877 - 2881
  • [30] EMISSION OF NEUTRAL AND NEGATIVE-ION CLUSTERS AT GRAPHITE AND SILICON SPUTTERING
    ABDULLAEVA, MK
    ATABAEV, BG
    DZHABBARGANOV, RD
    IZVESTIYA AKADEMII NAUK SSSR SERIYA FIZICHESKAYA, 1990, 54 (07): : 1322 - 1325