Room-temperature electrochemical deposition of ultrathin CuOx film as hole transport layer for perovskite solar cells

被引：22
|
作者：
Miao, Xu [1 ]
Wang, Shuo [1 ]
Sun, Wenhai [1 ]
Zhu, Yu [1 ]
Du, Chen [1 ]
Ma, Ruixin [1 ,3 ]
Wang, Chengyan [1 ,2 ]
机构：
[1] Univ Sci & Technol Beijing, Sch Met & Ecol Engn, Beijing 100083, Peoples R China
[2] Univ Sci & Technol Beijing, Beijing Key Lab Rare & Precious Met Green Recycli, Beijing 100083, Peoples R China
[3] Beijing Key Lab Special Melting & Preparat High E, Beijing 100083, Peoples R China
来源：
SCRIPTA MATERIALIA | 2019年 / 165卷
基金：
中国国家自然科学基金;
关键词：
Electrochemical deposition; CuOx; Perovskite solar cells; Hole transport materials; HALIDE PEROVSKITES; HIGHLY EFFICIENT; OXIDE; GROWTH; CU2O;
D O I：
10.1016/j.scriptamat.2019.02.032
中图分类号：
TB3 [工程材料学];
学科分类号：
0805 ; 080502 ;
摘要：
CuOx has attracted more attention as a hole transport material. Electrochemical deposition is a simple and efficient coating method, which avoids high temperature process, complicated operation and avoided material waste during coating process. The ultrathin CuOx films were fabricated in CuSO4 and lactic acid mixed liquids through a simple electrochemical deposition method. The CuOx thin films prepared at pH = 9 showed the best conductivity and light transmittance. After the optimization of the devices, the performance of the device shows a best power conversion efficiency (PCE) of 13.48% under standard AM 1.5G simulated solar irradiation with a shadow mask of 0.1cm(2) and remained over 75% PCE after storing for 500 h. (C) 2019 Acta Materialia Inc. Published by Elsevier Ltd. All rights reserved.
引用
收藏
页码：134 / 139
页数：6
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