High-resolution photoelectron spectroscopy in atoms and molecules

被引：0

作者：

Berrah, N ^{[1
]}

Nayandin, O ^{[1
]}

Conton-Rogan, SE ^{[1
]}

Kukk, E ^{[1
]}

Wills, AA ^{[1
]}

Gorczyca, TW ^{[1
]}

Snell, G ^{[1
]}

Liu, CN ^{[1
]}

Bozek, JD ^{[1
]}

Wiedenhoeft, M ^{[1
]}

机构：

[1] Western Michigan Univ, Dept Phys, Kalamazoo, MI 49008 USA

来源：

APPLICATION OF ACCELERATORS IN RESEARCH AND INDUSTRY | 2001年 / 576卷

关键词：

D O I：

暂无

中图分类号：

TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

New features are revealed by critically combining high photon resolution from the Advances Light Source and differential photoelectron spectroscopic techniques. Two LS-forbidden doubly-excited resonances have been observed in the 3p(3/2,1/2)(-1) partial cross-sections of Ar which exhibit mirroring profiles, resulting in complete cancellation in the total photoionization cross-section as was predicted by Liu and Starace [Phys. Rev. A 59, R1731 (1999)]. We will also discuss recent preliminary measurements on the vibrational structure and partial rates of resonant Auger decay of the N 1s -->2 pi core excitation in nitric oxide.

引用

页码：177 / 180

页数：4

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