共 27 条
- [21] Proposal and verification of evaluation method for shear strength and deformation capacity of damper using high performance fiber reinforced cementitious compositeJ. Struct. Constr. Eng., 2008, 634 (2185-2194):Building Resarch Institute, Japan论文数: 0 引用数: 0 h-index: 0不详论文数: 0 引用数: 0 h-index: 0
- [22] Evaluation of cooling measures performance and thermal-humidity environment for ultra-high geothermal railway tunnel construction by using WBGTENGINEERING APPLICATIONS OF COMPUTATIONAL FLUID MECHANICS, 2024, 18 (01)Zhao, Kaiming论文数: 0 引用数: 0 h-index: 0机构: Southwest Jiaotong Univ, Sch Mech Engn, Chengdu 610031, Peoples R China Southwest Jiaotong Univ, Sch Mech Engn, Chengdu 610031, Peoples R ChinaJi, Wenhui论文数: 0 引用数: 0 h-index: 0机构: Southwest Jiaotong Univ, Sch Mech Engn, Chengdu 610031, Peoples R China Southwest Jiaotong Univ, Sch Mech Engn, Chengdu 610031, Peoples R ChinaCao, Xiaoling论文数: 0 引用数: 0 h-index: 0机构: Southwest Jiaotong Univ, Sch Mech Engn, Chengdu 610031, Peoples R China Southwest Jiaotong Univ, Sch Mech Engn, Chengdu 610031, Peoples R ChinaYuan, Yanping论文数: 0 引用数: 0 h-index: 0机构: Southwest Jiaotong Univ, Sch Mech Engn, Chengdu 610031, Peoples R China Southwest Jiaotong Univ, Sch Mech Engn, Chengdu 610031, Peoples R ChinaLi, Haochen论文数: 0 引用数: 0 h-index: 0机构: Chongqing Survey & Design Inst Co Ltd, China Railway Eryuan Engn Grp, Chongqing, Peoples R China Southwest Jiaotong Univ, Sch Mech Engn, Chengdu 610031, Peoples R China
- [23] Performance Evaluation And Sensitivity Analysis Of A Low-capacity Single-effect LiBr-H2O Absorption Cooling System Using Energy And Exergy ModelingJOURNAL OF APPLIED SCIENCE AND ENGINEERING, 2025, 28 (09): : 1705 - 1715Hasan, Syed Maaz论文数: 0 引用数: 0 h-index: 0机构: Natl Univ Sci & Technol NUST, Sch Mech & Mfg Engn, Dept Mech Engn, H-12, Islamabad, Pakistan Natl Univ Sci & Technol NUST, Sch Mech & Mfg Engn, Dept Mech Engn, H-12, Islamabad, PakistanUl Haq, Muhammad Saad论文数: 0 引用数: 0 h-index: 0机构: Natl Univ Sci & Technol, US Pakistan Ctr Adv Studies Energy, H-12, Islamabad, Pakistan Natl Univ Sci & Technol NUST, Sch Mech & Mfg Engn, Dept Mech Engn, H-12, Islamabad, PakistanBadar, Abdul Waheed论文数: 0 引用数: 0 h-index: 0机构: Univ Bahrain, Coll Engn, Mech Engn Dept, Zallaq, Bahrain Natl Univ Sci & Technol NUST, Sch Mech & Mfg Engn, Dept Mech Engn, H-12, Islamabad, PakistanQureshi, M. Zahid Iqbal论文数: 0 引用数: 0 h-index: 0机构: Univ Wah, Dept Mech Engn, Quaid Ave, Wah Cantt, Pakistan Natl Univ Sci & Technol NUST, Sch Mech & Mfg Engn, Dept Mech Engn, H-12, Islamabad, Pakistan论文数: 引用数: h-index:机构:Siddiqi, M. Salman论文数: 0 引用数: 0 h-index: 0机构: Norwegian Univ Life Sci, Dept Mech Engn & Technol Management, As, Norway Natl Univ Sci & Technol NUST, Sch Mech & Mfg Engn, Dept Mech Engn, H-12, Islamabad, Pakistan
- [24] Performance evaluation of high-pressure cooling by using external rotary liquid applicator in milling Ti-6Al-4V alloyHELIYON, 2023, 9 (07)Sultana, Mst Nazma论文数: 0 引用数: 0 h-index: 0机构: Khulna Univ Engn & Technol, Dept Ind Engn & Management, Khulna 9203, Bangladesh Khulna Univ Engn & Technol, Dept Ind Engn & Management, Khulna 9203, BangladeshDhar, Nikhil Ranjan论文数: 0 引用数: 0 h-index: 0机构: Bangladesh Univ Engn & Technol, Dept Ind & Prod Engn, Dhaka 1000, Bangladesh Khulna Univ Engn & Technol, Dept Ind Engn & Management, Khulna 9203, Bangladesh
- [25] A 45nm high performance bulk logic platform technology (CMOS6) using ultra high NA(1.07) immersion lithography with hybrid dual-damascene structure and porous low-k BEOL2006 INTERNATIONAL ELECTRON DEVICES MEETING, VOLS 1 AND 2, 2006, : 419 - +Nii, H.论文数: 0 引用数: 0 h-index: 0机构: Toshiba Co Ltd, Syst LSI Div, 8 Shinsugita Cho, Yokohama, Kanagawa 2102582, Japan Toshiba Co Ltd, Syst LSI Div, 8 Shinsugita Cho, Yokohama, Kanagawa 2102582, JapanSanuki, T.论文数: 0 引用数: 0 h-index: 0机构: Toshiba Co Ltd, Syst LSI Div, 8 Shinsugita Cho, Yokohama, Kanagawa 2102582, Japan Toshiba Co Ltd, Syst LSI Div, 8 Shinsugita Cho, Yokohama, Kanagawa 2102582, JapanOkayama, Y.论文数: 0 引用数: 0 h-index: 0机构: Toshiba Co Ltd, Syst LSI Div, 8 Shinsugita Cho, Yokohama, Kanagawa 2102582, Japan Toshiba Co Ltd, Syst LSI Div, 8 Shinsugita Cho, Yokohama, Kanagawa 2102582, JapanOta, K.论文数: 0 引用数: 0 h-index: 0机构: Sony Corp, 8 Shinsugita Cho, Yokohama, Kanagawa 2102582, Japan Toshiba Co Ltd, Syst LSI Div, 8 Shinsugita Cho, Yokohama, Kanagawa 2102582, JapanIwarnoto, T.论文数: 0 引用数: 0 h-index: 0机构: NEC Elect Corp, 8 Shinsugita Cho, Yokohama, Kanagawa 2102582, Japan Toshiba Co Ltd, Syst LSI Div, 8 Shinsugita Cho, Yokohama, Kanagawa 2102582, JapanFujimaki, T.论文数: 0 引用数: 0 h-index: 0机构: Toshiba Co Ltd, Syst LSI Div, 8 Shinsugita Cho, Yokohama, Kanagawa 2102582, Japan Toshiba Co Ltd, Syst LSI Div, 8 Shinsugita Cho, Yokohama, Kanagawa 2102582, JapanKimura, T.论文数: 0 引用数: 0 h-index: 0机构: Toshiba Co Ltd, Syst LSI Div, 8 Shinsugita Cho, Yokohama, Kanagawa 2102582, Japan Toshiba Co Ltd, Syst LSI Div, 8 Shinsugita Cho, Yokohama, Kanagawa 2102582, JapanWatanabe, R.论文数: 0 引用数: 0 h-index: 0机构: Toshiba Co Ltd, Syst LSI Div, 8 Shinsugita Cho, Yokohama, Kanagawa 2102582, Japan Toshiba Co Ltd, Syst LSI Div, 8 Shinsugita Cho, Yokohama, Kanagawa 2102582, JapanKomoda, T.论文数: 0 引用数: 0 h-index: 0机构: Toshiba Co Ltd, Syst LSI Div, 8 Shinsugita Cho, Yokohama, Kanagawa 2102582, Japan Toshiba Co Ltd, Syst LSI Div, 8 Shinsugita Cho, Yokohama, Kanagawa 2102582, JapanEiho, A.论文数: 0 引用数: 0 h-index: 0机构: Toshiba Co Ltd, Syst LSI Div, 8 Shinsugita Cho, Yokohama, Kanagawa 2102582, Japan Toshiba Co Ltd, Syst LSI Div, 8 Shinsugita Cho, Yokohama, Kanagawa 2102582, JapanAikawa, K.论文数: 0 引用数: 0 h-index: 0机构: Toshiba Co Ltd, Syst LSI Div, 8 Shinsugita Cho, Yokohama, Kanagawa 2102582, Japan Toshiba Co Ltd, Syst LSI Div, 8 Shinsugita Cho, Yokohama, Kanagawa 2102582, JapanYamaguchi, H.论文数: 0 引用数: 0 h-index: 0机构: Toshiba Co Ltd, Syst LSI Div, 8 Shinsugita Cho, Yokohama, Kanagawa 2102582, Japan Toshiba Co Ltd, Syst LSI Div, 8 Shinsugita Cho, Yokohama, Kanagawa 2102582, JapanMorimoto, R.论文数: 0 引用数: 0 h-index: 0机构: Sony Corp, 8 Shinsugita Cho, Yokohama, Kanagawa 2102582, Japan Toshiba Co Ltd, Syst LSI Div, 8 Shinsugita Cho, Yokohama, Kanagawa 2102582, JapanOhshima, K.论文数: 0 引用数: 0 h-index: 0机构: Sony Corp, 8 Shinsugita Cho, Yokohama, Kanagawa 2102582, Japan Toshiba Co Ltd, Syst LSI Div, 8 Shinsugita Cho, Yokohama, Kanagawa 2102582, JapanYokoyama, T.论文数: 0 引用数: 0 h-index: 0机构: Sony Corp, 8 Shinsugita Cho, Yokohama, Kanagawa 2102582, Japan Toshiba Co Ltd, Syst LSI Div, 8 Shinsugita Cho, Yokohama, Kanagawa 2102582, JapanMatsumoto, T.论文数: 0 引用数: 0 h-index: 0机构: Sony Corp, 8 Shinsugita Cho, Yokohama, Kanagawa 2102582, Japan Toshiba Co Ltd, Syst LSI Div, 8 Shinsugita Cho, Yokohama, Kanagawa 2102582, JapanHachimine, K.论文数: 0 引用数: 0 h-index: 0机构: Sony Corp, 8 Shinsugita Cho, Yokohama, Kanagawa 2102582, Japan Toshiba Co Ltd, Syst LSI Div, 8 Shinsugita Cho, Yokohama, Kanagawa 2102582, JapanSogo, Y.论文数: 0 引用数: 0 h-index: 0机构: Sony Corp, 8 Shinsugita Cho, Yokohama, Kanagawa 2102582, Japan Toshiba Co Ltd, Syst LSI Div, 8 Shinsugita Cho, Yokohama, Kanagawa 2102582, JapanShino, S.论文数: 0 引用数: 0 h-index: 0机构: Sony Corp, 8 Shinsugita Cho, Yokohama, Kanagawa 2102582, Japan Toshiba Co Ltd, Syst LSI Div, 8 Shinsugita Cho, Yokohama, Kanagawa 2102582, JapanKanai, S.论文数: 0 引用数: 0 h-index: 0机构: Sony Corp, 8 Shinsugita Cho, Yokohama, Kanagawa 2102582, Japan Toshiba Co Ltd, Syst LSI Div, 8 Shinsugita Cho, Yokohama, Kanagawa 2102582, JapanYamazaki, T.论文数: 0 引用数: 0 h-index: 0机构: Sony Corp, 8 Shinsugita Cho, Yokohama, Kanagawa 2102582, Japan Toshiba Co Ltd, Syst LSI Div, 8 Shinsugita Cho, Yokohama, Kanagawa 2102582, JapanTakahashi, S.论文数: 0 引用数: 0 h-index: 0机构: Sony Corp, 8 Shinsugita Cho, Yokohama, Kanagawa 2102582, Japan Toshiba Co Ltd, Syst LSI Div, 8 Shinsugita Cho, Yokohama, Kanagawa 2102582, JapanMaeda, H.论文数: 0 引用数: 0 h-index: 0机构: Sony Corp, 8 Shinsugita Cho, Yokohama, Kanagawa 2102582, Japan Toshiba Co Ltd, Syst LSI Div, 8 Shinsugita Cho, Yokohama, Kanagawa 2102582, JapanIwata, T.论文数: 0 引用数: 0 h-index: 0机构: Sony Corp, 8 Shinsugita Cho, Yokohama, Kanagawa 2102582, Japan Toshiba Co Ltd, Syst LSI Div, 8 Shinsugita Cho, Yokohama, Kanagawa 2102582, JapanOhno, K.论文数: 0 引用数: 0 h-index: 0机构: Sony Corp, 8 Shinsugita Cho, Yokohama, Kanagawa 2102582, Japan Toshiba Co Ltd, Syst LSI Div, 8 Shinsugita Cho, Yokohama, Kanagawa 2102582, JapanTakegawa, Y.论文数: 0 引用数: 0 h-index: 0机构: Toshiba Co Ltd, Syst LSI Div, 8 Shinsugita Cho, Yokohama, Kanagawa 2102582, Japan Toshiba Co Ltd, Syst LSI Div, 8 Shinsugita Cho, Yokohama, Kanagawa 2102582, JapanOishi, A.论文数: 0 引用数: 0 h-index: 0机构: Toshiba Co Ltd, Syst LSI Div, 8 Shinsugita Cho, Yokohama, Kanagawa 2102582, Japan Toshiba Co Ltd, Syst LSI Div, 8 Shinsugita Cho, Yokohama, Kanagawa 2102582, JapanTogo, M.论文数: 0 引用数: 0 h-index: 0机构: NEC Elect Corp, 8 Shinsugita Cho, Yokohama, Kanagawa 2102582, Japan Toshiba Co Ltd, Syst LSI Div, 8 Shinsugita Cho, Yokohama, Kanagawa 2102582, JapanFukasaku, K.论文数: 0 引用数: 0 h-index: 0机构: Sony Corp, 8 Shinsugita Cho, Yokohama, Kanagawa 2102582, Japan Toshiba Co Ltd, Syst LSI Div, 8 Shinsugita Cho, Yokohama, Kanagawa 2102582, JapanTakasu, Y.论文数: 0 引用数: 0 h-index: 0机构: Toshiba Co Ltd, Proc Manufacturing Engn Ctr, 8 Shinsugita Cho, Yokohama, Kanagawa 2102582, Japan Toshiba Co Ltd, Syst LSI Div, 8 Shinsugita Cho, Yokohama, Kanagawa 2102582, JapanYamasaki, H.论文数: 0 引用数: 0 h-index: 0机构: Toshiba Co Ltd, Proc Manufacturing Engn Ctr, 8 Shinsugita Cho, Yokohama, Kanagawa 2102582, Japan Toshiba Co Ltd, Syst LSI Div, 8 Shinsugita Cho, Yokohama, Kanagawa 2102582, JapanInokuma, H.论文数: 0 引用数: 0 h-index: 0机构: Toshiba Co Ltd, Proc Manufacturing Engn Ctr, 8 Shinsugita Cho, Yokohama, Kanagawa 2102582, Japan Toshiba Co Ltd, Syst LSI Div, 8 Shinsugita Cho, Yokohama, Kanagawa 2102582, JapanMatsuo, K.论文数: 0 引用数: 0 h-index: 0机构: Toshiba Co Ltd, Proc Manufacturing Engn Ctr, 8 Shinsugita Cho, Yokohama, Kanagawa 2102582, Japan Toshiba Co Ltd, Syst LSI Div, 8 Shinsugita Cho, Yokohama, Kanagawa 2102582, JapanSato, T.论文数: 0 引用数: 0 h-index: 0机构: Toshiba Co Ltd, Proc Manufacturing Engn Ctr, 8 Shinsugita Cho, Yokohama, Kanagawa 2102582, Japan Toshiba Co Ltd, Syst LSI Div, 8 Shinsugita Cho, Yokohama, Kanagawa 2102582, JapanNakazawa, M.论文数: 0 引用数: 0 h-index: 0机构: Sony Corp, 8 Shinsugita Cho, Yokohama, Kanagawa 2102582, Japan Toshiba Co Ltd, Syst LSI Div, 8 Shinsugita Cho, Yokohama, Kanagawa 2102582, JapanKatagiri, T.论文数: 0 引用数: 0 h-index: 0机构: Sony Corp, 8 Shinsugita Cho, Yokohama, Kanagawa 2102582, Japan Toshiba Co Ltd, Syst LSI Div, 8 Shinsugita Cho, Yokohama, Kanagawa 2102582, JapanNakazawa, K.论文数: 0 引用数: 0 h-index: 0机构: Sony Corp, 8 Shinsugita Cho, Yokohama, Kanagawa 2102582, Japan Toshiba Co Ltd, Syst LSI Div, 8 Shinsugita Cho, Yokohama, Kanagawa 2102582, JapanShinyama, T.论文数: 0 引用数: 0 h-index: 0机构: Sony Corp, 8 Shinsugita Cho, Yokohama, Kanagawa 2102582, Japan Toshiba Co Ltd, Syst LSI Div, 8 Shinsugita Cho, Yokohama, Kanagawa 2102582, JapanTetsuka, T.论文数: 0 引用数: 0 h-index: 0机构: Sony Corp, 8 Shinsugita Cho, Yokohama, Kanagawa 2102582, Japan Toshiba Co Ltd, Syst LSI Div, 8 Shinsugita Cho, Yokohama, Kanagawa 2102582, JapanFujita, S.论文数: 0 引用数: 0 h-index: 0机构: Sony Corp, 8 Shinsugita Cho, Yokohama, Kanagawa 2102582, Japan Toshiba Co Ltd, Syst LSI Div, 8 Shinsugita Cho, Yokohama, Kanagawa 2102582, JapanKagawa, Y.论文数: 0 引用数: 0 h-index: 0机构: Sony Corp, 8 Shinsugita Cho, Yokohama, Kanagawa 2102582, Japan Toshiba Co Ltd, Syst LSI Div, 8 Shinsugita Cho, Yokohama, Kanagawa 2102582, JapanNagaoka, K.论文数: 0 引用数: 0 h-index: 0机构: Sony Corp, 8 Shinsugita Cho, Yokohama, Kanagawa 2102582, Japan Toshiba Co Ltd, Syst LSI Div, 8 Shinsugita Cho, Yokohama, Kanagawa 2102582, JapanMuramatsu, S.论文数: 0 引用数: 0 h-index: 0机构: NEC Elect Corp, 8 Shinsugita Cho, Yokohama, Kanagawa 2102582, Japan Toshiba Co Ltd, Syst LSI Div, 8 Shinsugita Cho, Yokohama, Kanagawa 2102582, JapanIwasa, S.论文数: 0 引用数: 0 h-index: 0机构: Toshiba Co Ltd, Proc Manufacturing Engn Ctr, 8 Shinsugita Cho, Yokohama, Kanagawa 2102582, Japan Toshiba Co Ltd, Syst LSI Div, 8 Shinsugita Cho, Yokohama, Kanagawa 2102582, JapanMimotogi, S.论文数: 0 引用数: 0 h-index: 0机构: Toshiba Co Ltd, Proc Manufacturing Engn Ctr, 8 Shinsugita Cho, Yokohama, Kanagawa 2102582, Japan Toshiba Co Ltd, Syst LSI Div, 8 Shinsugita Cho, Yokohama, Kanagawa 2102582, JapanYoshida, K.论文数: 0 引用数: 0 h-index: 0机构: Toshiba Co Ltd, Syst LSI Div, 8 Shinsugita Cho, Yokohama, Kanagawa 2102582, Japan Toshiba Co Ltd, Syst LSI Div, 8 Shinsugita Cho, Yokohama, Kanagawa 2102582, JapanSunouchi, K.论文数: 0 引用数: 0 h-index: 0机构: Toshiba Co Ltd, Syst LSI Div, 8 Shinsugita Cho, Yokohama, Kanagawa 2102582, Japan Toshiba Co Ltd, Syst LSI Div, 8 Shinsugita Cho, Yokohama, Kanagawa 2102582, JapanIwai, M.论文数: 0 引用数: 0 h-index: 0机构: Toshiba Co Ltd, Syst LSI Div, 8 Shinsugita Cho, Yokohama, Kanagawa 2102582, Japan Toshiba Co Ltd, Syst LSI Div, 8 Shinsugita Cho, Yokohama, Kanagawa 2102582, JapanSaito, M.论文数: 0 引用数: 0 h-index: 0机构: Sony Corp, 8 Shinsugita Cho, Yokohama, Kanagawa 2102582, Japan Toshiba Co Ltd, Syst LSI Div, 8 Shinsugita Cho, Yokohama, Kanagawa 2102582, JapanIkeda, M.论文数: 0 引用数: 0 h-index: 0机构: NEC Elect Corp, 8 Shinsugita Cho, Yokohama, Kanagawa 2102582, Japan Toshiba Co Ltd, Syst LSI Div, 8 Shinsugita Cho, Yokohama, Kanagawa 2102582, Japan
- [26] Balanced Performance Enhancements of a-InGaZnO Thin Film Transistors by Using All-Amorphous Dielectric Multilayers Sandwiching High-k CaCu3Ti4O12ADVANCED ELECTRONIC MATERIALS, 2019, 5 (10):论文数: 引用数: h-index:机构:Han, Chan Su论文数: 0 引用数: 0 h-index: 0机构: Yonsei Univ, Dept Mat Sci & Engn, Seoul 03722, South Korea Yonsei Univ, Dept Mat Sci & Engn, Seoul 03722, South KoreaMohanty, Bhaskar Chandra论文数: 0 引用数: 0 h-index: 0机构: Thapar Inst Engn & Technol, Sch Phys & Mat Sci, Patiala 147004, Punjab, India Yonsei Univ, Dept Mat Sci & Engn, Seoul 03722, South KoreaChoi, Hongje论文数: 0 引用数: 0 h-index: 0机构: Yonsei Univ, Dept Mat Sci & Engn, Seoul 03722, South Korea Yonsei Univ, Dept Mat Sci & Engn, Seoul 03722, South KoreaLee, Jin Hyeok论文数: 0 引用数: 0 h-index: 0机构: Yonsei Univ, Dept Elect & Elect Engn, Seoul 03722, South Korea Yonsei Univ, Dept Mat Sci & Engn, Seoul 03722, South KoreaKim, Hymn Jae论文数: 0 引用数: 0 h-index: 0机构: Yonsei Univ, Dept Elect & Elect Engn, Seoul 03722, South Korea Yonsei Univ, Dept Mat Sci & Engn, Seoul 03722, South KoreaCho, Yong Soo论文数: 0 引用数: 0 h-index: 0机构: Yonsei Univ, Dept Mat Sci & Engn, Seoul 03722, South Korea Yonsei Univ, Dept Mat Sci & Engn, Seoul 03722, South Korea
- [27] Performance Evaluation of Novel Low Leakage Double-gate FinFET Device at sub-22nm with LaAlO3 High-k Gate Oxide and TiN Metal Gate using Quantum Modeling2014 INTERNATIONAL CONFERENCE ON ELECTRONICS AND COMMUNICATION SYSTEMS (ICECS), 2014,Subramaniam, Subha论文数: 0 引用数: 0 h-index: 0机构: VJTI, Dept Elect Engn, Bombay, Maharashtra, India VJTI, Dept Elect Engn, Bombay, Maharashtra, IndiaJoshi, Sangeeta M.论文数: 0 引用数: 0 h-index: 0机构: VIT, Dept Elect Engn, Bombay, Maharashtra, India VJTI, Dept Elect Engn, Bombay, Maharashtra, IndiaAwale, R. N.论文数: 0 引用数: 0 h-index: 0机构: VJTI, Dept Elect Engn, Bombay, Maharashtra, India VJTI, Dept Elect Engn, Bombay, Maharashtra, India