Rapid nanopatterning technique based on monolayer silica nanosphere close-packing by spin coating

Nanoparticles monolayer formation by spin coating is considered to be a simple, fast and inexpensive nanopatterning technique. However, the parameters that govern the overall growth process in this technique are not completely quantified and techniques for the controlled and continuous growth of close packed monolayer particle arrays without defects need to be developed. In this paper, an ordered particle array formation process is analyzed theoretically, employing material flux balance and particle- subjected forces balance, based on the film thickness model of spin coating and evaporation rate law. A series of experiments were conducted using silica particle suspensions with various particle volume fractions and different spin speeds. The results show that the spin speed should match the particle volume fraction to meet the requirements of material flux and particles movement in order to obtain a close packed monolayer film. The formation mechanism of fabrication defects involving particle agglomeration and uncontrollable voids were analyzed qualitatively based on crystal growth theory, and validation experiments were performed. The formation of highly uniform close-packed monolayer films was demonstrated and the condition requirements for achieving monolayer nanoparticles array with good quality presented.