Passive damping of thin film Nitinol

被引：0
|
作者：
Kerrigan, Catherine A. [1 ]
Mohachandra, K. P. [1 ]
Carman, Gregory P. [1 ]
机构：
[1] Univ Calif Los Angeles, Dept Mech & Aerosp Engn, Los Angeles, CA 90095 USA
来源：
SMART STRUCTURES AND MATERIALS 2006: DAMPING AND ISOLATION | 2006年 / 6169卷
关键词：
damping; Nitinol; shape memory alloy; SMA; laminate; twin boundary motion;
D O I：
10.1117/12.658824
中图分类号：
TH [机械、仪表工业];
学科分类号：
0802 ;
摘要：
Thin film Nitinol is evaluated for a new damping solution to microscale damping. In this study, thin fihn Nitinol was mechanically tested under steady and cyclic tensile loads in a DMA Q800 load frame to determine stifffiess and hysteric losses (tan delta = 0.17). A method of determining the damping properties of a multilayered laminate was derived and evaluated using measured and predicted values of Nitinol film damping. Hysteretic loss of tan delta 0.76 was predicted for a tensile/compressive loading of a film indicative of loading in a MEMS structure. Damping in a silicon/Nitinol laminate using the tensile/compressive loading film damping prediction was calculated to be tan delta = 0.127.
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页数：10
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