Structure and Electrical Characteristics of Zinc Oxide Thin Films Grown on Si (111) by Metal-organic Chemical Vapor Deposition

被引:12
|
作者
Wu, Yunfeng [1 ,2 ]
Liu, Dongping [1 ,2 ]
Yu, Naisen [2 ]
Liu, Yuanda [1 ]
Liang, Hongwei [1 ]
Du, Guotong [1 ]
机构
[1] Dalian Univ Technol, Sch Phys & Optoelect Technol, Dalian 116024, Peoples R China
[2] Dalian Nationalities Univ, Sch Phys & Mat Engn, Dalian 116600, Peoples R China
基金
中国国家自然科学基金;
关键词
ZnO thin films; Metal-organic chemical vapor deposition; Conductive atomic force microscopy; Scanning electron microscopy; MOLECULAR-BEAM EPITAXY; ZNO FILMS; PHOTOLUMINESCENCE; GAN; TEMPERATURE; NANO;
D O I
10.1016/j.jmst.2013.06.011
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
ZnO thin films were grown on Si (111) substrates by low-pressure metal-organic chemical vapor deposition. The crystal structures and electrical properties of as-grown sample were investigated by scanning electron microscopy (SEM) and conductive atomic force microscopy (C-AFM). It can be seen that with increasing growth temperature, the surface morphology of ZnO thin films changed from flake-like to cobblestones-like structure. The current maps were simultaneously recorded with the topography, which was gained by C-AFM contact mode. Conductivity for the off-axis facet planes presented on ZnO grains enhanced. Measurement results indicate that the off-axis facet planes were more electrically active than the c-plane of ZnO flakes or particles probably due to lower Schottky barrier height of the off-axis facet planes.
引用
收藏
页码:830 / 834
页数:5
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