TOF-SIMS analysis using C60- effect of impact energy on yield and damage

被引:73
|
作者
Fletcher, JS [1 ]
Conlan, XA [1 ]
Jones, EA [1 ]
Biddulph, G [1 ]
Lockyer, NP [1 ]
Vickerman, JC [1 ]
机构
[1] Univ Manchester, Surface Anal Res Ctr, Sch Chem Engn & Analyt Sci, Manchester M60 1QD, Lancs, England
关键词
D O I
10.1021/ac051624w
中图分类号
O65 [分析化学];
学科分类号
070302 ; 081704 ;
摘要
C-60 has been shown to give increased sputter yields and, hence, secondary ions when used as a primary particle in SIMS analysis. In addition, for many samples, there is also a reduction in damage accumulation following continued bombardment with the ion beam. In this paper, we report a study of the impact energy (up to 120 keV) of C60 on the secondary ion yield from a number of samples with consideration of any variation in yield response over mass ranges up to m/z 2000. Although increased impact energy is expected to produce a corresponding increase in sputter yield/rate, it is important to investigate any increase in sample damage with increasing energy and, hence, efficiency of the ion beams. On our test samples including a metal, along with organic samples, there is a general increase in secondary ion yield of high-mass species with increasing impact energy. A corresponding reduction in the formation of low-mass fragments is also observed. Depth profiling of organic samples demonstrates that when using C-60, there does not appear to be any increase in damage evident in the mass spectra as the impact energy is increased.
引用
收藏
页码:1827 / 1831
页数:5
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