Direct laser writing of 3D polymer micro/nanostructures on metallic surfaces

被引:26
|
作者
Rekstyte, Sima [1 ]
Zukauskas, Albertas [1 ]
Purlys, Vytautas [1 ]
Gordienko, Yuri [2 ]
Malinauskas, Mangirdas [1 ]
机构
[1] Vilnius Univ, Fac Phys, Dept Quantum Elect, Laser Res Ctr, LT-10223 Vilnius, Lithuania
[2] Natl Acad Sci, GV Kurdyumov Inst Met Phys, Kiev, Ukraine
关键词
Direct laser writing; Hybrid polymers; 3D microstructures; Opaque surfaces; Integrated microsystems; Electro conductive surfaces; 2-PHOTON POLYMERIZATION; PHOTOPOLYMERIZATION; FABRICATION; COMPONENTS; SU-8;
D O I
10.1016/j.apsusc.2013.01.034
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
Spectra of fields for applications of polymeric 3D micro/nanostructures are rapidly widening thus demanding the development of versatile precise and efficient fabrication methods that can be used to process a variety of materials and could be implemented to form tiny devices on a variety of surfaces without influencing their structural quality. We present the latest results obtained using laser lithography approach: 3D polymeric structures with submicrometer spatial resolution on different opaque surfaces such as semiconductors (Si) and various metals (Cr, Al, Fe and Ti). The photostructuring was performed using a range of photosensitive materials such as acrylate based AKRE23, acrylated biodegradable PEG-DA-258, epoxy based mr-NIL 6000, hybrid organic-inorganic SZ2080 and Ormocore b59. (c) 2013 Elsevier B.V. All rights reserved.
引用
收藏
页码:382 / 387
页数:6
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