Texture-directed twin formation propensity in Al with high stacking fault energy

被引：39

作者：

Xue, S. ^{[1
]}

Kuo, W. ^{[2
]}

Li, Q. ^{[1
]}

Fan, Z. ^{[1
]}

Ding, J. ^{[1
]}

Su, R. ^{[1
]}

Wang, H. ^{[1
]}

Zhang, X. ^{[1
]}

机构：

[1] Purdue Univ, Sch Mat Engn, W Lafayette, IN 47907 USA

[2] Texas A&M Univ, Mat Characterizat Facil, College Stn, TX 77843 USA

来源：

ACTA MATERIALIA | 2018年 / 144卷

基金：

美国国家科学基金会;

关键词：

Twinned Al; Growth twins; Sputtering; Orientation dependence; MOLECULAR-DYNAMICS SIMULATION; CENTERED-CUBIC METALS; SHAPE-MEMORY ALLOYS; TRANSMISSION KIKUCHI DIFFRACTION; SCANNING-ELECTRON-MICROSCOPE; NANOCRYSTALLINE ALUMINUM; HIGH-STRENGTH; GROWTH TWINS; SUBSTRUCTURE EVOLUTION; FORMATION MECHANISMS;

D O I：

10.1016/j.actamat.2017.10.053

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

Twin boundaries can enhance the strength and preserve the ductility of a variety of metallic materials with face centered cubic structures. However, twin boundaries are rare in aluminum due to its high stacking fault energy. There are limited successes for the formation of nanotwins in Al. Here, we show that twin morphology and twin density in Al can be altered by tailoring the textures of films. Transmission Kikuchi diffraction and transmission electron microscopy studies on (111), (110) and (112) textured Al films indicate that Al (112) film has the highest twin density. Two design criteria are identified for the introduction of a high density of growth twins into Al. Published by Elsevier Ltd on behalf of Acta Materialia Inc.

引用

页码：226 / 234

页数：9

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