Near-field microwave scanning probe imaging of conductivity inhomogeneities in CVD graphene

被引:55
|
作者
Tselev, Alexander [1 ,2 ]
Lavrik, Nickolay V. [1 ]
Vlassiouk, Ivan [3 ]
Briggs, Dayrl P. [1 ]
Rutgers, Maarten [4 ]
Proksch, Roger [4 ]
Kalinin, Sergei V. [1 ]
机构
[1] Oak Ridge Natl Lab, Ctr Nanophase Mat Sci, Oak Ridge, TN 37831 USA
[2] Univ Tennessee, Dept Phys & Astron, Knoxville, TN 37996 USA
[3] Oak Ridge Natl Lab, Measurement Sci & Syst Engn Div, Oak Ridge, TN 37831 USA
[4] Asylum Res, Santa Barbara, CA 93117 USA
关键词
CHEMICAL-VAPOR-DEPOSITION; ATOMIC LAYER DEPOSITION; FILMS; DIELECTRICS; RESISTANCE; PHOTONICS;
D O I
10.1088/0957-4484/23/38/385706
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
We have performed near-field scanning microwave microscopy (SMM) of graphene grown by chemical vapor deposition. Due to the use of probe-sample capacitive coupling and a relatively high ac frequency of a few GHz, this scanning probe method allows mapping of local conductivity without a dedicated counter electrode, with a spatial resolution of about 50 nm. Here, the coupling was enabled by atomic layer deposition of alumina on top of graphene, which in turn enabled imaging both large-area films, as well as micron-sized islands, with a dynamic range covering a low sheet resistance of a metal film and a high resistance of highly disordered graphene. The structures of graphene grown on Ni films and Cu foils are explored, and the effects of growth conditions are elucidated. We present a simple general scheme for interpretation of the contrast in the SMM images of our graphene samples and other two-dimensional conductors, which is supported by extensive numerical finite-element modeling. We further demonstrate that combination of the SMM and numerical modeling allows quantitative information about the sheet resistance of graphene to be obtained, paving the pathway for characterization of graphene conductivity with a sub-100 nm special resolution.
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页数:11
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