The Influence of the Inorganic Species on Oxidative Degradation of 4-chlorophenol by Photo-Fenton Type Process

被引:0
|
作者
Orbeci, Cristina [1 ]
Untea, Ion [1 ]
Kopsiaftis, Georgios [2 ]
机构
[1] Univ Politehn Bucuresti, Fac Appl Chem & Mat Sci, Bucharest 011061, Romania
[2] SANOFI AVENTIS Greece, Dept Oncol, Athens 17674, Greece
来源
REVISTA DE CHIMIE | 2008年 / 59卷 / 09期
关键词
photo-Fenton; 4-chlorophenol oxidation; inorganic species influence;
D O I
暂无
中图分类号
O6 [化学];
学科分类号
0703 ;
摘要
An experimental study on 4-chlorophenol (4-CP) degradation in aqueous solutions by advanced oxidation process photo-Fenton type is presented. The efficiency of the oxidation process is determined by the very high oxidative potential of the OH center dot radicals generated by catalytic and photo-catalytic processes. The presence of the inorganic species inside the reaction medium influences the rate of the oxidation process as function of their nature and concentration. The inorganic anionic species reduce drastically the 4-CP oxidation efficiency by Fe2+/3+ complexing processes, HO center dot radicals scavenging effect or iron precipitate forming. The decrease of the 4-CP oxidation degree is correlated with the nature of the anions as following: Cl- > PO43- > SO42- >> NO3-. The presence of the insoluble inorganic species (bentonite) modirtes the oxidation efficiency by additional 4-CP and UV sorption processes, especially at high solution turbidity values.
引用
收藏
页码:952 / 955
页数:4
相关论文
共 50 条
  • [41] Systematic Assessment of the influence of Hydrogen Peroxide Dosage on Caffeine Degradation by the Photo-Fenton Process
    Yamal-Turbay, Evelyn
    Graells, Moises
    Perez-Moya, Montserrat
    [J]. INDUSTRIAL & ENGINEERING CHEMISTRY RESEARCH, 2012, 51 (13) : 4770 - 4778
  • [42] Pyrimethanil degradation by photo-Fenton process: Influence of iron and irradiance level on treatment cost
    Reina, A. Cabrera
    Miralles-Cuevas, S.
    Casas Lopez, J. L.
    Sanchez Perez, J. A.
    [J]. SCIENCE OF THE TOTAL ENVIRONMENT, 2017, 605 : 230 - 237
  • [43] Ecosafety Screening of Photo-Fenton Process for the Degradation of Microplastics in Water
    Piazza, Veronica
    Uheida, Abdusalam
    Gambardella, Chiara
    Garaventa, Francesca
    Faimali, Marco
    Dutta, Joydeep
    [J]. FRONTIERS IN MARINE SCIENCE, 2022, 8
  • [44] Phenol degradation in water through a heterogeneous photo-fenton process
    Iurascu, Beatrice
    Siminiceanu, IIie
    Vincente, Miguel
    [J]. ENVIRONMENTAL ENGINEERING AND MANAGEMENT JOURNAL, 2007, 6 (06): : 479 - 482
  • [45] Degradation of Organic Contaminant in Landfill Leachate by Photo-Fenton Process
    Zheng Huai-li
    Pan Yun-xia
    Li Dan-dan
    Wu You-quan
    [J]. SPECTROSCOPY AND SPECTRAL ANALYSIS, 2009, 29 (06) : 1661 - 1664
  • [46] Degradation of Antibiotic Ciprofloxacin Hydrochloride by Photo-Fenton Oxidation Process
    Sun, Sheng-Peng
    Guo, Hui-Qin
    Ke, Qiang
    Sun, Jian-Hui
    Shi, Shao-Hui
    Zhang, Min-Li
    Zhou, Qi
    [J]. ENVIRONMENTAL ENGINEERING SCIENCE, 2009, 26 (04) : 753 - 759
  • [47] Simultaneous degradation of pharmaceuticals by classic and modified photo-Fenton process
    Paiva, Vinicius A. B.
    Paniagua, Cleiseano E. S.
    Ricardo, Ivo Amildon
    Goncalves, Barbara R.
    Martins, Stefanie Pereira
    Daniel, Daniela
    Machado, Antonio E. H.
    Trovo, Alam G.
    [J]. JOURNAL OF ENVIRONMENTAL CHEMICAL ENGINEERING, 2018, 6 (01): : 1086 - 1092
  • [48] Characterization of the degradation performance of the sulfamethazine antibiotic by photo-Fenton process
    Perez-Moya, Montserrat
    Graells, Moises
    Castells, Gloria
    Amigo, Jordi
    Ortega, Esther
    Buhigas, Guillem
    Perez, Leonardo M.
    Mansilla, Hector D.
    [J]. WATER RESEARCH, 2010, 44 (08) : 2533 - 2540
  • [49] Humic acid degradation in aqueous solution by the photo-Fenton process
    Katsumata, Hideyuki
    Sada, Maki
    Kaneco, Satoshi
    Suzuki, Tohru
    Ohta, Kiyohisa
    Yobiko, Yoshihiro
    [J]. Chemical Engineering Journal, 2008, 137 (02): : 225 - 230
  • [50] Humic acid degradation in aqueous solution by the photo-Fenton process
    Katsumata, Hideyuki
    Sada, Maki
    Kaneco, Satoshi
    Suzuki, Tohru
    Ohta, Kiyohisa
    Yobiko, Yoshihiro
    [J]. CHEMICAL ENGINEERING JOURNAL, 2008, 137 (02) : 225 - 230