Electrical resistivity of Cu and Nb thin films and multilayers

被引：15
|
作者：
Fenn, M [1 ]
Petford-Long, AK [1 ]
Donovan, PE [1 ]
机构：
[1] Univ Oxford, Dept Mat, Oxford OX1 3PH, England
来源：
JOURNAL OF MAGNETISM AND MAGNETIC MATERIALS | 1999年 / 198-99卷
基金：
英国工程与自然科学研究理事会;
关键词：
electrical resistivity; thin films; Dimmich's theory;
D O I：
10.1016/S0304-8853(98)01062-2
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
We have measured the resistivity, temperature coefficient of resistivity (TCR) and grain sizes in single films of Cu and Nb as a function of film thickness. We have compared our experimental results with the predictions of the theory due to Dimmich. This theory allows us to extract a value for grain boundary reflectivity, R, which is subsequently used in the analysis of the resistivity and TCR of Cu/Nb multilayers. We present our values for grain boundary reflectivity and the subsequent fit to the experimental resistivity and TCR using Dimmich's equations. (C) 1999 Elsevier Science B.V. All rights reserved.
引用
收藏
页码：231 / 232
页数：2
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