Microstructure and mechanical properties of SiCN hard films deposited by an arc enhanced magnetic sputtering hybrid system

被引：44

作者：

Ma, Shengli ^{[1
]}

Xu, Bin ^{[1
]}

Wu, Guizhi ^{[1
]}

Wang, Yanfeng ^{[1
]}

Ma, Fei ^{[1
]}

Ma, Dayan ^{[1
]}

Xu, Kewei ^{[1
]}

Bell, Tom ^{[1
]}

机构：

[1] Xian Jiaotong Univ, State Key Lab Mech Behav Mat, Xian 710049, Peoples R China

来源：

SURFACE & COATINGS TECHNOLOGY | 2008年 / 202卷 / 22-23期

基金：

中国国家自然科学基金;

关键词：

AEMS; SiCN films; Nanocomposites; Hardness; Friction coefficient;

D O I：

10.1016/j.surfcoat.2008.06.057

中图分类号：

TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

SiCN hard films have been synthesized on stainless steel substrates by an arc enhanced magnetic sputtering hybrid system using a silicon target and graphite target in mixed gases of Ar and N-2. The XRD results indicate that basically the SiCN films are amorphous. However, the HR-TEM results confirm that the microstructure of the SiCN films with a high silicon content are nanocomposites in which nano-sized crystalline C3N4 hard particles are embedded in the amorphous SiCN matrix. The hardness of the SiCN films is found to increase with increasing silicon contents, and the maximum hardness is 35 GPa. The SiCN hard films show a surprising low friction coefficient of 0.2 when the silicon content is relatively low. (C) 2008 Elsevier B.V. All rights reserved.

引用

页码：5379 / 5382

页数：4

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