Fabrication of photonic ring resonator device in silicon waveguide technology using soft UV-nanoimprint lithography

被引：13
|
作者：
Plachetka, U. [1 ]
Koo, N. [1 ]
Wahlbrink, T. [1 ]
Bolten, J. [1 ]
Waldow, M. [2 ]
Ploetzing, T. [2 ]
Foerst, M. [2 ]
Kurz, H. [1 ]
机构：
[1] AMICA, D-52074 Aachen, Germany
[2] Univ Aachen, RWTH Aachen, Inst Semicond Elect, D-52074 Aachen, Germany
来源：
IEEE PHOTONICS TECHNOLOGY LETTERS | 2008年 / 20卷 / 5-8期
关键词：
integrated optics; lithography; nanoimprint; photonics; resonator;
D O I：
10.1109/LPT.2008.918386
中图分类号：
TM [电工技术]; TN [电子技术、通信技术];
学科分类号：
0808 ; 0809 ;
摘要：
We report on an innovative fabrication method for high-quality resonant photonic devices on silicon-on-insulator substrates with quality (Q)-factor of 47700 and propagation losses of 3.5 dB/cm. The definition of a resonator device using soft ultraviolet-nanoimprint lithography is detailed followed by description of an adapted structure transfer process. Spectral response measurements and propagation loss analysis were carried out evidencing the functionality of the fabricated resonator.
引用
收藏
页码：490 / 492
页数：3
相关论文
共 50 条
  • [31] Replication of rose-petal surface structure using UV-nanoimprint lithography
    Choo, Soyoung
    Choi, Hak-Jong
    Lee, Heon
    MATERIALS LETTERS, 2014, 121 : 170 - 173
  • [32] Large-scale fabrication of nanopatterned sapphire substrates by annealing of patterned Al thin films by soft UV-nanoimprint lithography
    Lin Cui
    Jie-Cai Han
    Gui-Gen Wang
    Hua-Yu Zhang
    Rui Sun
    Ling-Hua Li
    Nanoscale Research Letters, 8
  • [33] Nanoscale patterning with the double-layered soft cylindrical stamps by means of UV-nanoimprint lithography
    Park, SooYeon
    Choi, KeeBong
    Kim, GeeHong
    Lee, JaeJong
    MICROELECTRONIC ENGINEERING, 2009, 86 (4-6) : 604 - 607
  • [34] Integrated Soft UV-Nanoimprint Lithography in a Nanopositioning and Nanomeasuring machine for accurate positioning of stamp to substrate
    Supreeti, Shraddha
    Kirchner, Johannes
    Hofmann, Martin
    Mastylo, Rostyslav
    Rangelow, Ivo W.
    Manske, Eberhard
    Hoffmann, Martin
    Sinzinger, Stefan
    NOVEL PATTERNING TECHNOLOGIES FOR SEMICONDUCTORS, MEMS/NEMS, AND MOEMS 2019, 2019, 10958
  • [35] Large-scale fabrication of nanopatterned sapphire substrates by annealing of patterned Al thin films by soft UV-nanoimprint lithography
    Cui, Lin
    Han, Jie-Cai
    Wang, Gui-Gen
    Zhang, Hua-Yu
    Sun, Rui
    Li, Ling-Hua
    NANOSCALE RESEARCH LETTERS, 2013, 8 : 1 - 6
  • [36] ENHANCED LIGHT EXTRACTION FROM COLLOIDAL ZnO QD FILM BY ADDING ON PHOTONIC CRYSTALS USING UV-NANOIMPRINT LITHOGRAPHY
    Li, Xiali
    Yang, Guangqian
    Chen, Jian
    Zhang, Rongjun
    Zhou, Weimin
    Liu, Yanbo
    Zhang, Jing
    Wang, Qingkang
    SURFACE REVIEW AND LETTERS, 2009, 16 (03) : 367 - 373
  • [37] Applications of UV-nanoimprint soft stamps in fabrication of single-frequency diode lasers
    Viheriala, Jukka
    Tommila, Juha
    Leinonen, Tomi
    Dumitrescu, Mihail
    Toikkanen, Lauri
    Niemi, Tapio
    Pessa, Markus
    MICROELECTRONIC ENGINEERING, 2009, 86 (03) : 321 - 324
  • [38] Manufacturing of nanostructures with high aspect ratios using soft UV-nanoimprint lithography with bi- and trilayer resist systems
    Handte, Thomas
    Scheller, Nicolas
    Dittrich, Lars
    Thesen, Manuel W.
    Messerschmidt, Martin
    Sinzinger, Stefan
    MICRO AND NANO ENGINEERING, 2022, 14
  • [39] UV-soft Imprinted Tunable Polymer Waveguide Ring Resonator for Microwave Photonic Filtering
    Han, Xiuyou
    Wang, Linghua
    Wang, Yu
    Zou, Pin
    Gu, Yiying
    Teng, Jie
    Wang, Jinyan
    Jian, Xigao
    Morthier, Geert
    Zhao, Mingshan
    JOURNAL OF LIGHTWAVE TECHNOLOGY, 2014, 32 (20) : 3924 - 3932
  • [40] Nano-scale patterning using the roll typed UV-nanoimprint lithography tool
    Lee, JaeJong
    Park, SooYeon
    Choi, KeeBong
    Kim, GeeHong
    MICROELECTRONIC ENGINEERING, 2008, 85 (5-6) : 861 - 865
12345