CHARACTERIZATION OF SPUTTERED ZnO BLOCKING LAYERS WITH SURFACE PLASMON RESONANCE METHOD

被引：0
|
作者：
Danchuk, V. [1 ]
Shatalov, N. [1 ]
Pogreb, R. [2 ]
Musin, A. [2 ]
机构：
[1] Ariel Univ, Fac Engn, Dept Chem Engn Biotechnol & Mat, Ariel, Israel
[2] Ariel Univ, Phys Dept, Fac Nat Sci, Ariel, Israel
来源：
OPTIMIZATION OF THE COMPOSITION, STRUCTURE AND PROPERTIES OF METALS, OXIDES, COMPOSITES, NANO AND AMORPHOUS MATERIALS | 2019年
关键词：
THIN-FILMS;
D O I：
暂无
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
Thickness and dielectric permittivity of nanoscale polycrystalline ZnO films were revealed with a surface plasmon resonance (SPR) method using spectroscopic ellipsometry data [1]. The UV-Vis absorption spectra of the ZnO films were measured, and their bandgaps were evaluated from the fundamental absorption edge. Performed research allowed us to determine the sputtering regimes of nanoscale ZnO films that are promising for use as a blocking layer in a planar perovskite-based solar cells.
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页码：186 / 193
页数：8
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