High-frequency characterization of thermionic charge transport in silicon-on-insulator nanowire transistors

被引:10
|
作者
Betz, A. C. [1 ]
Barraud, S. [2 ]
Wilmart, Q. [3 ,4 ]
Placais, B. [3 ,4 ]
Jehl, X. [2 ]
Sanquer, M. [2 ]
Gonzalez-Zalba, M. F. [1 ]
机构
[1] Hitachi Cambridge Lab, Cambridge CB3 0HE, England
[2] UMR E CEA UJF Grenoble 1, INAC, SPSMS, F-38054 Grenoble, France
[3] Univ Paris 06, ENS CNRS UMR 8551, Lab Pierre Aigrain, F-75231 Paris 05, France
[4] Univ Paris Diderot, F-75231 Paris 05, France
关键词
QUANTUM CAPACITANCE;
D O I
10.1063/1.4863538
中图分类号
O59 [应用物理学];
学科分类号
摘要
We report on DC and microwave electrical transport measurements in silicon-on-insulator nano-transistors at low and room temperature. At low source-drain voltage, the DC current and radio frequency response show signs of conductance quantization. We attribute this to Coulomb blockade resulting from barriers formed at the spacer-gate interfaces. We show that at high bias transport occurs thermionically over the highest barrier: Transconductance traces obtained from microwave scattering-parameter measurements at liquid helium and room temperature are accurately fitted by a thermionic model. From the fits we deduce the ratio of gate capacitance and quantum capacitance, as well as the electron temperature. (C) 2014 AIP Publishing LLC.
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页数:4
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