Near-field optical photomask repair with a femtosecond laser

被引：0
|
作者：
Lieberman, K [1 ]
Shani, Y [1 ]
Melnik, I [1 ]
Yoffe, S [1 ]
Sharon, Y [1 ]
机构：
[1] Nanon Lithog Ltd, IL-91487 Jerusalem, Israel
来源：
JOURNAL OF MICROSCOPY-OXFORD | 1999年 / 194卷
关键词：
laser ablation; near-field optics; photomask repair;
D O I：
暂无
中图分类号：
TH742 [显微镜];
学科分类号：
摘要：
We present a high-resolution near-field optical tool designed for repair of opaque defects in binary photomasks. Both instrument design and near-field imaging and patterning results will be presented, Designed for ablative processing of thin metal films, the MR-100 incorporates an industrial amplified femtosecond laser, third harmonic generator and built-in autocorrelator. The ultrashort duration of the femtosecond pulses enables the tool to remove chrome layers with negligible damage to the surrounding metal or the underlying quartz substrate. The micropipette based near-field writing head can deliver power densities of hundreds of GW/cm(2) to spots of several hundred nanometres and below Repairs on sample masks will be presented and the repair quality will be discussed.
引用
收藏
页码：537 / 541
页数：5
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