Blue Light Plasma Emission During LIBWE Using 532 nm Q-switched Nanosecond Laser

被引:7
|
作者
Cheng, Ji-Yen [1 ,2 ]
Mousavi, Mansoureh Z. [1 ,3 ,4 ]
Wu, Chun-Ying [1 ,2 ]
Tsai, Hsieh-Fu [1 ]
机构
[1] Acad Sinica, Res Ctr Appl Sci, Taipei 11529, Taiwan
[2] Natl Taiwan Ocean Univ, Dept Mech & Mechatron Engn, Chilung, Taiwan
[3] Acad Sinica, Nano Sci & Technol Program, Taiwan Int Grad Program, Taipei 11529, Taiwan
[4] Natl Taiwan Univ, Dept Chem, Taipei, Taiwan
来源
关键词
visible LIBWE; microfabrication; plasma; nanosecond laser; 532 nm Q-switched laser; FUSED-SILICA; TRANSPARENT MATERIALS; EXCIMER-LASER; UV LASER; GLASS; FABRICATION;
D O I
10.2961/jlmn.2012.01.0017
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
Blue light (360 nm similar to 500 nm) emission from the glass/liquid interface was observed during the etching using a green (lambda = 532 nm) nanosecond Q-switched laser. An organic dye, Oil-Red-O, dissolved in p-xylene was used for laser induced backside wet etching of borosilicate glass using the visible light laser (visible-LIBWE). The blue light emission was confirmed to accompany the etching process. The UV-visible spectrum consists of characteristic peaks of metals, which are the components of the glass material. The maximal emission intensity occurs when the laser focusing is at the glass/liquid interface. The threshold of the LIBWE etching is comparable to that of the occurrence of the blue light emission. We concluded that the emission is the plasma emission of the etched glass. By measuring the plasma emission, the occurrence of the etching and the crack formation in the glass can be monitored in real-time.
引用
收藏
页码:87 / 92
页数:6
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