High-frequency characteristics of CoFeVAlONb thin films

被引:7
|
作者
Lee, K. E. [2 ]
Ha, N. D. [1 ]
Phan, M. H. [3 ]
Kim, C. O. [1 ]
机构
[1] Chungnam Natl Univ, Res Ctr Adv Magnet Mat, Taejon 305764, South Korea
[2] Chungnam Natl Univ, Dept Mat Sci & Engn, Taejon 305764, South Korea
[3] Univ Bristol, Dept Aerosp Engn, Bristol BS8 1TR, Avon, England
关键词
Nanogranular; Soft magnetic thin films; High frequency thin films; Microstructure;
D O I
10.1016/j.jmmm.2006.01.157
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
High-frequency characteristics of CoFeVAlONb thin films were studied. A thin film of Co43.47Fe35.30V1.54Al5.55O9.93Nb4.21 is observed to exhibit excellent magnetic properties; magnetic coercivity of 1.24 Oe, uniaxial in-plane anisotropy field of 66.99 Oe, and saturation magnetization of 19.8 kG. The effective permeability of the film is as high as 1089 and is stable up to 1.8 GHz, and with ferromagnetic resonance over 3 GHz. This film also has very high electrical resistivity of about 628 mu Omega cm. These superior properties make it ideal for high-frequency magnetic applications. (C) 2006 Elsevier B. V. All rights reserved.
引用
收藏
页码:E189 / E191
页数:3
相关论文
共 50 条
  • [41] High frequency characteristics of tin oxide thin films on Si
    Yueksel, Oe. Faruk
    Ocak, S. B.
    Selcuk, A. B.
    [J]. VACUUM, 2008, 82 (11) : 1183 - 1186
  • [42] Magnetic properties and high frequency characteristics of FeCoN thin films
    Hwang, Tae-Jong
    Lee, Joonsik
    Kim, Ki Hyeon
    Kim, Dong Ho
    [J]. AIP ADVANCES, 2016, 6 (05):
  • [43] Characteristics of the high-frequency electrocardiogram
    Ge, JG
    Chen, H
    Xu, Z
    [J]. IEEE-EMBS ASIA PACIFIC CONFERENCE ON BIOMEDICAL ENGINEERING - PROCEEDINGS, PTS 1 & 2, 2000, : 155 - 156
  • [44] HIGH-FREQUENCY CHARACTERISTICS OF MESFETS
    AFZALIKUSHAA, A
    HADDAD, GI
    [J]. SOLID-STATE ELECTRONICS, 1995, 38 (02) : 401 - 406
  • [45] High-frequency fatigue test of metallic thin films using PVDF microactuator
    Tamjidi, Nastaran
    Sato, Kohei
    Suzaki, Ryo
    Nakamitsu, Yutaka
    Sakurai, Junpei
    Hata, Seiichi
    [J]. IEICE ELECTRONICS EXPRESS, 2012, 9 (05): : 403 - 409
  • [46] Influence of Cu Underlayer on the High-Frequency Magnetic Properties of FeCoSiO Thin Films
    Lu, G. D.
    Miao, X. S.
    Cheng, W. M.
    Huang, X. F.
    Yang, L.
    Pan, L. Q.
    [J]. IEEE TRANSACTIONS ON MAGNETICS, 2015, 51 (11)
  • [47] PREPARATION AND HIGH-FREQUENCY IMPEDANCE STUDIES OF COFEMOB AMORPHOUS THIN-FILMS
    MEI, LM
    LIU, YH
    [J]. JOURNAL OF PHYSICS F-METAL PHYSICS, 1986, 16 (12): : 2131 - 2137
  • [48] High-frequency behavior of FeN thin films fabricated by using reactive sputtering
    Hwang, Tae-Jong
    Lee, Joonsik
    Kim, Ki Hyeon
    Kim, Dong Ho
    [J]. JOURNAL OF THE KOREAN PHYSICAL SOCIETY, 2016, 69 (03) : 304 - 309
  • [49] Microstructure and Properties of Thin Films of Zirconium Produced by High-Frequency Laser Deposition
    Bosak, N. A.
    Chumakov, A. N.
    Baran, L. V.
    Malyutina-Bronskaya, V. V.
    Ivkovich, M.
    Sakan, N.
    Ivanov, A. A.
    [J]. JOURNAL OF APPLIED SPECTROSCOPY, 2024, 90 (06) : 1236 - 1240
  • [50] SOME CHARACTERISTIC FEATURES OF FORMATION OF THIN POLYSILOXANE FILMS IN A HIGH-FREQUENCY DISCHARGE
    TKACHUK, BV
    SHUSTOV, AI
    [J]. HIGH ENERGY CHEMISTRY, 1975, 9 (05) : 409 - 412