Transient behavior of Hg1-xCdxTe films deposited on (100)CdTe substrates by chemical vapor transport

被引:4
|
作者
Wiedemeier, H
Ge, YR
机构
[1] Department of Chemistry, Rensselaer Polytechnic Institute, Troy
关键词
chemical vapor transport (CVT); epitaxial growth; HgCdTe; mass flux; transient behavior;
D O I
10.1007/BF02659906
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
The growth history of Hg1-xCdxTe films deposited on (100) CdTe substrates by chemical vapor transport (CVT) has been studied, for the first time, by using a transient growth technique. The observed morphological evolution of Hg1-xCdxTe films deposited at 545 degrees C shows a transition behavior from three-dimensional (3D) islands to two-dimensional (2D) layer growth. The experimental results indicate that the so-called critical time needed for the above morphological transition is about 1h under present experimental conditions. Based on the chemical bonding properties of Hg1-xCdxTe, and on the behavior of the morphological transition, the Stranski-Krastanov growth mode is suggested for the epitaxial growth system. The time dependence of the growth thickness, of the growth rate (R(100)) along the [100] direction, and of the surface composition all reveal a transient behavior. These are related to the nature of the Hg1-xCdxTe/(100)CdTe heterojunction and to the surface reactions. Comparison of the growth rates and of the total mass deposited as a function of time shows the relationship between epitaxial growth and mass flux of the Hg1-xCdxTe-HgI2 chemical vapor transport system.
引用
收藏
页码:1072 / 1081
页数:10
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