Fabrication of Nano-engineered Transparent Conducting Oxides by Pulsed Laser Deposition

被引:9
|
作者
Gondoni, Paolo [1 ,2 ]
Ghidelli, Matteo [1 ,2 ]
Di Fonzo, Fabio [1 ,2 ,3 ]
Li Bassi, Andrea [1 ,2 ,3 ]
Casari, Carlo S. [1 ,2 ]
机构
[1] Politecn Milan, Dept Energy, Milan, Italy
[2] Politecn Milan, NEMAS Ctr NanoEngn Mat & Surfaces, Milan, Italy
[3] Inst Italiano Tecnol, Ctr Nano Sci & Technol, Genoa, Italy
来源
关键词
Materials Science; Issue; 72; Physics; Nanotechnology; Nanoengineering; Oxides; thin films; thin film theory; deposition and growth; Pulsed laser Deposition (PLD); Transparent conducting oxides (TCO); Hierarchically organized Nanostructured oxides; Al doped ZnO (AZO) films; enhanced light scattering capability; gases; deposition; nanoporus; nanoparticles; Van der Pauw; scanning electron microscopy; SEM; TUNGSTEN-OXIDE; THIN-FILMS; REGIMES;
D O I
10.3791/50297
中图分类号
O [数理科学和化学]; P [天文学、地球科学]; Q [生物科学]; N [自然科学总论];
学科分类号
07 ; 0710 ; 09 ;
摘要
Nanosecond Pulsed Laser Deposition (PLD) in the presence of a background gas allows the deposition of metal oxides with tunable morphology, structure, density and stoichiometry by a proper control of the plasma plume expansion dynamics. Such versatility can be exploited to produce nanostructured films from compact and dense to nanoporous characterized by a hierarchical assembly of nano-sized clusters. In particular we describe the detailed methodology to fabricate two types of Al-doped ZnO (AZO) films as transparent electrodes in photovoltaic devices: 1) at low O-2 pressure, compact films with electrical conductivity and optical transparency close to the state of the art transparent conducting oxides (TCO) can be deposited at room temperature, to be compatible with thermally sensitive materials such as polymers used in organic photovoltaics (OPVs); 2) highly light scattering hierarchical structures resembling a forest of nano-trees are produced at higher pressures. Such structures show high Haze factor (>80%) and may be exploited to enhance the light trapping capability. The method here described for AZO films can be applied to other metal oxides relevant for technological applications such as TiO2, Al2O3, WO3 and Ag4O4.
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页数:8
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