Optical absorption dependence on composition and thickness of InxGa1-xN (0.05 < x < 0.22) grown on GaN/sapphire

被引:4
|
作者
Jampana, Balakrishnam R. [1 ]
Weiland, Conan R. [1 ]
Opila, Robert L. [1 ]
Ferguson, Ian T. [2 ]
Honsberg, Christiana B. [3 ]
机构
[1] Univ Delaware, Newark, DE 19716 USA
[2] Univ N Carolina, Dept Elect & Comp Engn, Charlotte, NC 28223 USA
[3] Arizona State Univ, Sch Elect Comp & Energy Engn, Tempe, AZ 85287 USA
关键词
Indium gallium nitride; Optical absorption; Crystalline defects; X-ray diffraction; CRITICAL LAYER THICKNESS; BAND-GAP; INGAN/GAN; HETEROSTRUCTURES; FILMS;
D O I
10.1016/j.tsf.2012.07.003
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
We report the change in optical absorption properties of InGaN epilayers around the critical layer thickness determined from X-ray diffraction. Detrimental sub-band gap absorption is observed in InGaN thin films grown beyond the critical layer thicknesses, and is caused by localized electric fields around extended crystalline defects and aided by V-defects through light channeling. The photoluminescence response from InGaN thin films, grown beyond the critical layer thickness, is reduced owing to absorption of the incident laser light by non-radiative recombination extended crystalline defects. The formation of V-defects is observed to occur beyond the critical layer thickness and continues to grow in areal coverage aiding in sub-band gap absorption. This optical behavior sets constraints to be incorporated in the design of InGaN solar cell and requirement for improvement in epitaxial growth techniques to reduce V-defects. (C) 2012 Elsevier B.V. All rights reserved.
引用
收藏
页码:6807 / 6812
页数:6
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