Influence of V Content on Microstructure, Mechanical and Friction Properties of TaVN Composite Films

被引:6
|
作者
Xu Jun-Hua [1 ]
Xue Ya-Ping [1 ]
Cao Jun [1 ]
Yu Li-Hua [1 ]
机构
[1] Jiangsu Univ Sci & Technol, Jiangsu Key Lab Adv Welding Technol, Zhenjiang 212003, Peoples R China
基金
中国国家自然科学基金;
关键词
TaVN composited films; magnetron sputtering technique; mechanical properties; friction properties; THIN-FILMS; SUPERLATTICE COATINGS; TRIBOLOGICAL BEHAVIOR; SPUTTER-DEPOSITION; DIFFUSION-BARRIERS; OXIDE FORMATION; N COATINGS; TIALN/VN; TEMPERATURES; RESISTORS;
D O I
10.3724/SP.J.1077.2013.12498
中图分类号
TQ174 [陶瓷工业]; TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
A series of TaVN composite films with different V contents were fabricated by magnetron sputtering technique. The microstructures, mechanical properties, friction properties at different temperatures were investigated by X-ray diffraction, nano-indentation, CSM high-temperature ball-on-disc tribo-meter, respectively. The results show that the microstructure of TaVN films has fcc structure. With V content increasing, the preferential orientation changes from (111) to (200), and the hardness increases to a peak value (32.3 GPa) and then decreases. At room temperature, the friction coefficient of TaVN films decreases as V content increases, which may be related to the formation of V2O5. When the temperatures increase from room temperature to 800 degrees C, the friction coefficient increases and then decreases. The friction mechanisms of TaVN composite films and TaN film at high temperature are compared based on the crystal chemistry theory.
引用
收藏
页码:769 / 774
页数:6
相关论文
共 24 条
  • [21] Electrical and structural properties of Ta-N thin film and Ta/Ta-N multilayer for embedded resistor
    Na, Suok-Min
    Park, In-Soo
    Park, Se-Young
    Jeong, Geun-Hee
    Suh, Su-Jeong
    [J]. THIN SOLID FILMS, 2008, 516 (16) : 5465 - 5469
  • [22] TERNARY AMORPHOUS METALLIC THIN-FILMS AS DIFFUSION-BARRIERS FOR CU METALLIZATION
    NICOLET, MA
    [J]. APPLIED SURFACE SCIENCE, 1995, 91 (1-4) : 269 - 276
  • [23] Reactive sputter deposition and properties of TaxN thin films
    Riekkinen, T
    Molarius, J
    Laurila, T
    Nurmela, A
    Suni, I
    Kivilahti, JK
    [J]. MICROELECTRONIC ENGINEERING, 2002, 64 (1-4) : 289 - 297
  • [24] Wear and friction of TiAlN/VN coatings against Al2O3 in air at room and elevated temperatures
    Zhou, Z.
    Rainforth, W. M.
    Luo, Q.
    Hovsepian, P. Eh.
    Ojeda, J. J.
    Romero-Gonzalez, M. E.
    [J]. ACTA MATERIALIA, 2010, 58 (08) : 2912 - 2925