Influence of V Content on Microstructure, Mechanical and Friction Properties of TaVN Composite Films

被引:6
|
作者
Xu Jun-Hua [1 ]
Xue Ya-Ping [1 ]
Cao Jun [1 ]
Yu Li-Hua [1 ]
机构
[1] Jiangsu Univ Sci & Technol, Jiangsu Key Lab Adv Welding Technol, Zhenjiang 212003, Peoples R China
基金
中国国家自然科学基金;
关键词
TaVN composited films; magnetron sputtering technique; mechanical properties; friction properties; THIN-FILMS; SUPERLATTICE COATINGS; TRIBOLOGICAL BEHAVIOR; SPUTTER-DEPOSITION; DIFFUSION-BARRIERS; OXIDE FORMATION; N COATINGS; TIALN/VN; TEMPERATURES; RESISTORS;
D O I
10.3724/SP.J.1077.2013.12498
中图分类号
TQ174 [陶瓷工业]; TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
A series of TaVN composite films with different V contents were fabricated by magnetron sputtering technique. The microstructures, mechanical properties, friction properties at different temperatures were investigated by X-ray diffraction, nano-indentation, CSM high-temperature ball-on-disc tribo-meter, respectively. The results show that the microstructure of TaVN films has fcc structure. With V content increasing, the preferential orientation changes from (111) to (200), and the hardness increases to a peak value (32.3 GPa) and then decreases. At room temperature, the friction coefficient of TaVN films decreases as V content increases, which may be related to the formation of V2O5. When the temperatures increase from room temperature to 800 degrees C, the friction coefficient increases and then decreases. The friction mechanisms of TaVN composite films and TaN film at high temperature are compared based on the crystal chemistry theory.
引用
收藏
页码:769 / 774
页数:6
相关论文
共 24 条
  • [1] Ali E A, 2005, SURFACE COATINGS TEC, V200, P1792
  • [2] Electrical reliability aspects of HfO2 high-k gate dielectrics with TaN metal gate electrodes under constant voltage stress
    Chatterjee, S
    Kuo, Y
    Lu, J
    Tewg, JY
    Majhi, P
    [J]. MICROELECTRONICS RELIABILITY, 2006, 46 (01) : 69 - 76
  • [3] Structural and electrical characterization of tantalum nitride thin film resistors deposited on AIN substrates for π-type attenuator applications
    Cuong, Nguyen Duy
    Kim, Dong-Jin
    Kang, Byoung-Don
    Yoon, Soon-Gil
    [J]. MATERIALS SCIENCE AND ENGINEERING B-SOLID STATE MATERIALS FOR ADVANCED TECHNOLOGY, 2006, 135 (02): : 162 - 165
  • [4] A crystal-chemical approach to lubrication by solid oxides
    Erdemir, A
    [J]. TRIBOLOGY LETTERS, 2000, 8 (2-3) : 97 - 102
  • [5] TI(C,N) COATINGS USING THE ARC PROCESS
    ERTURK, E
    KNOTEK, O
    BURGMER, W
    PRENGEL, HG
    HEUVEL, HJ
    DEDERICHS, HG
    STOSSEL, C
    [J]. SURFACE & COATINGS TECHNOLOGY, 1991, 46 (01): : 39 - 46
  • [6] Influence of high-temperature oxide formation on the tribological behaviour of TiN and VN coatings
    Fateh, N.
    Fontalvo, G. A.
    Gassner, G.
    Mitterer, C.
    [J]. WEAR, 2007, 262 (9-10) : 1152 - 1158
  • [7] A new low friction concept for high temperatures: lubricious oxide formation on sputtered VN coatings
    Gassner, G
    Mayrhofer, PH
    Kutschej, K
    Mitterer, C
    Kathrein, M
    [J]. TRIBOLOGY LETTERS, 2004, 17 (04) : 751 - 756
  • [8] Microhardness and structural analysis of (TI,AI)N, (Ti,Cr)N, (Ti,Zr)N and (TI,V)N films
    Hasegawa, H
    Kimura, A
    Suzuki, T
    [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A, 2000, 18 (03): : 1038 - 1040
  • [9] Recent progress in large-scale production of nanoscale multilayer/superlattice hard coatings
    Hovsepian, PE
    Münz, WD
    [J]. VACUUM, 2002, 69 (1-3) : 27 - 36
  • [10] Boundary-free multi-element barrier films by reactive co-sputtering
    Hsieh, JH
    Li, C
    Wang, CM
    Tang, ZZ
    [J]. SURFACE & COATINGS TECHNOLOGY, 2005, 198 (1-3): : 335 - 339