Optimization of a rapid thermal annealing process for PbTiO3 thin films obtained by RF magnetron sputtering

Lead titanate (PT) thin films have been deposited on two different substrates by radio frequency magnetron sputtering from pressed powders targets. The films have been deposited without substrate heating. So as to obtain the perovskite structure from the amorphous film, a rapid thermal annealing (RT.A.) as post deposition treatment has been used. The influence of the target composition on the crystallised film composition was studied. For the R.T.A. process, the influence of the heating and cooling rate, the annealing time, the annealing temperature and the atmosphere (O-2) On the composition, structure and micro structure of PT films was investigated. The SiO2 / PT interface and the microstructure of the PT films obtained by the RTA process and by a conventional furnace annealing (C.F.A.) process have been compared.