Continuing specific heat measurements of 3He in 3He-4He mixture films

被引：4

作者：

Ho, PC ^{[1
]}

Akimoto, H ^{[1
]}

Hallock, RB ^{[1
]}

机构：

[1] Univ Massachusetts, Dept Phys, Low Temp Phys Lab, Amherst, MA 01003 USA

来源：

JOURNAL OF LOW TEMPERATURE PHYSICS | 2002年 / 126卷 / 1-2期

关键词：

D O I：

10.1023/A:1013701303365

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

Additional data from our on-going experiments for the heat capacity of He-3 in He-3-He-4 mixture films on a Nuclepore substrate are reported over the temperature range 90 less than or equal to T < 165 mK, for He-3 coverages between 0.05 and 1.4 bulk-density atomic layers, on a He-4 film of thickness 4.33 bulk-density atomic layers. This is a two-dimensional Fermi liquid system, in which we can change the He-3 coverage and thus tune the Fermi temperature.

引用

页码：349 / 354

页数：6

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