Structural Enhancement of ZnO Thin Films by Sol-Gel Process for Photonic Applications

被引：0

作者：

Kumar, Sanjeev ^{[1
]}

Kapoor, A. ^{[1
]}

Singh, Fouran ^{[2
]}

机构：

[1] Univ Delhi, Dept Elect Sci, New Delhi 110021, India

[2] Inter Univ Accelerator Ctr, Mat Sci Grp, New Delhi, India

来源：

2013 Workshop on Recent Advances in Photonics (WRAP) | 2013年

关键词：

ZnO thin Film; UV-Visible Spectroscopy; Atomic force microscopy;

D O I：

暂无

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

Zinc oxide (ZnO) thin film is grown on glass substrate by the sol-gel spin coating technique. The prepared film annealed at 450 degrees C. X-ray diffraction shows that the ZnO Film is polycrystalline with (002) preferential orientation. We have found the Surface roughness was minimum (12.4 nm) by atomic force microscopy. The optical band gap is found to be 3.12 +/- 0.01 eV by UV-visible Spectroscopy. The Wave guiding properties of the thin film has been also studied. The results indicate that our film is monomode at 632.8 nm with propagation optical loss estimated around 1.6 dB/cm.

引用

页数：2

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