Hall effect in charged conducting ferroelectric domain walls

被引:53
|
作者
Campbell, M. P. [1 ]
McConville, J. P. V. [1 ]
McQuaid, R. G. P. [1 ]
Prabhakaran, D. [2 ]
Kumar, A. [1 ]
Gregg, J. M. [1 ]
机构
[1] Queens Univ Belfast, Sch Math & Phys, Ctr Nanostruct Media, Belfast BT7 1NN, Antrim, North Ireland
[2] Dept Phys, Clarendon Lab, Parks Rd, Oxford OX1 3PU, England
来源
NATURE COMMUNICATIONS | 2016年 / 7卷
基金
英国工程与自然科学研究理事会;
关键词
THIN-FILMS; YMNO3; TRANSPORT; CRYSTALS; MOBILITY; MOTION;
D O I
10.1038/ncomms13764
中图分类号
O [数理科学和化学]; P [天文学、地球科学]; Q [生物科学]; N [自然科学总论];
学科分类号
07 ; 0710 ; 09 ;
摘要
Enhanced conductivity at specific domain walls in ferroelectrics is now an established phenomenon. Surprisingly, however, little is known about the most fundamental aspects of conduction. Carrier types, densities and mobilities have not been determined and transport mechanisms are still a matter of guesswork. Here we demonstrate that intermittent-contact atomic force microscopy (AFM) can detect the Hall effect in conducting domain walls. Studying YbMnO3 single crystals, we have confirmed that p-type conduction occurs in tail-to-tail charged domain walls. By calibration of the AFM signal, an upper estimate of similar to 1 x 10(16) cm(-3) is calculated for the mobile carrier density in the wall, around four orders of magnitude below that required for complete screening of the polar discontinuity. A carrier mobility of similar to 50 cm(2)V(-1)s(-1) is calculated, about an order of magnitude below equivalent carrier mobilities in p-type silicon, but sufficiently high to preclude carrier-lattice coupling associated with small polarons.
引用
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页数:6
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