Investigation of the depth range through ultra-thin carbon films on magnetic layers by time-of-flight secondary ion mass spectrometry

被引：2
|
作者：
Tadokoro, N [1 ]
Yuki, M [1 ]
Osakabe, K [1 ]
机构：
[1] HOYA Corp, R&D Ctr, Electro Opt Co, Tokyo 1968510, Japan
来源：
APPLIED SURFACE SCIENCE | 2003年 / 203卷
关键词：
TOF-SIMS; XPS; magnetic disk; sampling depth; escape depth; incidence angle;
D O I：
10.1016/S0169-4332(02)00681-5
中图分类号：
O64 [物理化学（理论化学）、化学物理学];
学科分类号：
070304 ; 081704 ;
摘要：
This paper presents an examination of the depth range of magnetic layers through ultra-thin carbon films by time-of-flight secondary ion mass spectrometry (TOF-SIMS). X-ray photoelectron spectroscopy (XPS) was used for comparison of TOF-SIMS. The sampling depth of TOF-SIMS is somewhat smaller than that of XPS. And also, the sampling depth obtained from this analysis is larger than that of the static SIMS (less than 1 nm) [Surf. Interf. Anal. 10 (1987) 384]. Our results suggest that the sampling depth is related to the sample structure (defects or pinholes of nanometer scale), the sensitivity of analytical tools and the emission process. (C) 2002 Elsevier Science B.V. All rights reserved.
引用
收藏
页码：72 / 77
页数：6
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