Magnetization reversal in nanotriangles fabricated by nanosphere lithography

被引：4

作者：

Wang, X. H. ^{[1
]}

Sekhar, M. Chandra ^{[1
]}

Purnama, I. ^{[1
]}

Lew, W. S. ^{[1
]}

Goolaup, S. ^{[1
]}

Cong, C. X. ^{[1
]}

机构：

[1] Nanyang Technol Univ, Sch Phys & Math Sci, Singapore 637371, Singapore

来源：

THIN SOLID FILMS | 2012年 / 520卷 / 23期

关键词：

Nanosphere lithography; Magnetic nanostructures; Magnetization reversal; Magnetic property simulation;

D O I：

10.1016/j.tsf.2012.06.054

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

We report on the magnetization reversal behavior of sub 100-nm triangular shaped Ni80Fe20 dot array fabricated by nanosphere lithography. Hysteresis loops measured by magneto-optical Kerr effect magnetometry are classified into single and double-switched loops in 45 nm, 80 nm and 100 nm triangular nanomagnets. Micromagnetic simulations show that a plateau observed in the double-switched loop in the 100-nm triangular nanomagnet is due to the formation of a metastable mediating V state. (C) 2012 Elsevier B. V. All rights reserved.

引用

页码：6980 / 6984

页数：5

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