Probing the elastic properties of individual nanostructures by combining in situ atomic force microscopy and micro-x-ray diffraction

被引:33
|
作者
Scheler, T. [1 ]
Rodrigues, M. [1 ]
Cornelius, T. W. [1 ]
Mocuta, C. [1 ]
Malachias, A. [1 ]
Magalhaes-Paniago, R. [1 ]
Comin, F. [1 ]
Chevrier, J. [1 ,2 ]
Metzger, T. H. [1 ]
机构
[1] European Synchrotron Radiat Facil, F-38043 Grenoble, France
[2] CNRS UJF, Inst Neel, F-38042 Grenoble 9, France
关键词
atomic force microscopy; elasticity; elemental semiconductors; Ge-Si alloys; indentation; lattice constants; nanostructured materials; self-assembly; silicon; X-ray diffraction; X-ray scattering;
D O I
10.1063/1.3067988
中图分类号
O59 [应用物理学];
学科分类号
摘要
Atomic force microscopy (AFM) and micro-x-ray diffraction are combined to investigate nanostructures during in situ indentation. This technique allows the determination of elastic properties of individual nanoscale objects, particularly here SiGe/Si(001) self-assembled islands. Using this novel technique it was possible to select a specific island, align it in the microfocused beam, and apply a pressure onto it, using the AFM tip. Simultaneously, the x-ray diffuse scattering map from the island and the surrounding substrate was recorded in order to probe the lattice parameter change during indentation. An elastic reduction of the island lattice parameter of up to 0.6% was achieved.
引用
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页数:3
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