Microstructural characterization of pulsed electrodeposited Au/Sn alloy thin films

被引:30
|
作者
Djurfors, B [1 ]
Ivey, DG [1 ]
机构
[1] Univ Alberta, Dept Chem & Mat Engn, Edmonton, AB T6G 2G6, Canada
基金
加拿大自然科学与工程研究理事会;
关键词
electroplating; pulsed; Au; Sn; thin film; microstructure; eutectic; solder;
D O I
10.1016/S0921-5107(02)00060-0
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Based on previous work that identified an electrodeposited composite, multi-layer structure as a viable method of producing eutectic Au/Sn alloys for solder applications, a study of individual phase formation was undertaken. The AuSn phase, because of its higher deposition current (> 2.0 mA cm(-2)), has a much faster deposition rate than Au5Sn, which is deposited at <1.0 mA cm(-2). AuSn formation is growth controlled, while Au5Sn formation is nucleation controlled. The AuSn forms a continuous layer within 60 s with a grain size of 50-75 nm. Because of the high deposition current, the dominant formation mechanism is two-dimensional nucleation, resulting in a relatively rough surface finish. Au5Sn, on the other hand, forms a continuous layer within 600 s with an average grain size of 200 nun, Because of the significantly lower deposition current, the dominant formation mechanism is lateral spreading instead of two-dimensional nucleation. The result is a very smooth finish on the deposit surface. (C) 2002 Elsevier Science B.V. All rights reserved.
引用
收藏
页码:309 / 320
页数:12
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