Biased MOS-FET and polycrystalline silicon tracks investigated by photothermal reflectance microscopy

被引：0
|
作者：
Batista, JA [1 ]
Mansanares, AM [1 ]
Fournier, D [1 ]
机构：
[1] UNIV ESTADUAL CAMPINAS,INST FIS GLEB WATAGHIN,BR-13083970 CAMPINAS,SP,BRAZIL
来源：
9TH INTERNATIONAL CONFERENCE ON PHOTOACOUSTIC AND PHOTOTHERMAL PHENOMENA, CONFERENCE DIGEST | 1996年
关键词：
D O I：
暂无
中图分类号：
O42 [声学];
学科分类号：
070206 ; 082403 ;
摘要：
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页码：468 / 469
页数：2
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