Rotational temperature measurements of excited and ground states of C2(d3Πg-a3Πu) transition in a H2/CH4 915 MHz microwave pulsed plasma

被引:32
|
作者
Duten, X [1 ]
Rousseau, A [1 ]
Gicquel, A [1 ]
Leprince, P [1 ]
机构
[1] Univ Paris 13, Lab Ingn Mat & Hautes Press, F-93430 Villetaneuse, France
关键词
D O I
10.1063/1.371515
中图分类号
O59 [应用物理学];
学科分类号
摘要
The rotational temperature of a low energy (0.09 eV), C-2 Swan band state (a (3)Pi u), obtained by white light absorption, is compared to the rotational temperatures of three electronic excited states [C-2(d (3)Pi g),CH(A(2)Delta) and CN(B (2)Sigma(+))] in a high power, H-2/CH4 microwave plasma used for diamond deposition. All temperatures are measured at 50 mbar, and both continuous (as a function of microwave power) and pulsed (as a function of time after the pulse) modes of operation are investigated. The rotational temperature of C-2's excited state is found to be higher than that of the low energy state (assumed equal to the gas temperature), indicating that the excitation of C-2 is to a large extent the result of chemical reactions (chemiluminescence) rather than electronic excitation. The rotational temperatures of CH(A (2)Delta) and CN(B (2)Sigma(+)) excited states are also higher than that for C-2's low energy state temperature. (C) 1999 American Institute of Physics. [S0021-8979(99)09320-2].
引用
收藏
页码:5299 / 5301
页数:3
相关论文
共 50 条
  • [11] TEMPERATURE-DEPENDENCE OF THE C2(API-3U)+CH4 REACTION FROM 337 TO 605-K
    PASTERNACK, L
    BARONAVSKI, AP
    MCDONALD, JR
    JOURNAL OF CHEMICAL PHYSICS, 1980, 73 (07): : 3508 - 3510
  • [12] INVESTIGATION OF VIBRATIONAL-ROTATIONAL DISTRIBUTION OF HF MOLECULES FORMED IN REACTIONS OF FLUORINE-ATOMS WITH MOLECULES H2, CH4, C2H6, C2H4, C2H2, CH3CN, C3H6
    VASILEV, GK
    IVANOV, VB
    MAKAROV, EF
    RYABENKO, AG
    TALROZE, VL
    BULLETIN OF THE ACADEMY OF SCIENCES OF THE USSR DIVISION OF CHEMICAL SCIENCE, 1975, 24 (03): : 463 - 468
  • [13] Behaviour of the 3C-SiC(100) c(2 x 2) (C-terminated) and 3 x 2 (Si-rich) surface reconstructions upon initial H2/CH4 microwave plasma exposures
    Portail, M
    Saada, S
    Delclos, S
    Arnault, JC
    Soukiassian, P
    Bergonzo, P
    Chassagne, T
    Leycuras, A
    PHYSICA STATUS SOLIDI A-APPLICATIONS AND MATERIALS SCIENCE, 2005, 202 (11): : 2234 - 2239
  • [14] Rate coefficients for the reactions of C2(a3Πu) and C2(X1Σg+) with various hydrocarbons (CH4, C2H2, C2H4, C2H6, and C3H8):: A gas-phase experimental study over the temperature range 24-300 K
    Paramo, Alejandra
    Canosa, Andre
    Le Picard, Sebastien D.
    Sims, Ian R.
    JOURNAL OF PHYSICAL CHEMISTRY A, 2008, 112 (39): : 9591 - 9600
  • [15] THE INFLUENCE OF PURE VIBRATIONAL-EXCITATION ON THE POPULATION OF LEVELS OF EMITTING ELECTRONIC STATES AND THE DETERMINATION OF ROTATIONAL TEMPERATURE IN LOW-PRESSURE PLASMA - C3-PI-U-(N2) AND D3-PI-U-(H2, D2) STATES
    BUBLINA, NV
    LAVROV, BP
    PROSIKHIN, VP
    VESTNIK LENINGRADSKOGO UNIVERSITETA SERIYA FIZIKA KHIMIYA, 1985, (03): : 25 - 30
  • [16] A low temperature investigation of the N(2D) + CH4, C2H6 and C3H8 reactions
    Nunez-Reyes, Dianailys
    Loison, Jean-Christophe
    Hickson, Kevin M.
    Dobrijevic, Michel
    PHYSICAL CHEMISTRY CHEMICAL PHYSICS, 2019, 21 (12) : 6574 - 6581
  • [17] Influence of the pressure and power on the non-equilibrium plasma chemistry of C2, C2H, C2H2,CH3 and CH4 affecting the synthesis of nanodiamond thin films from C2H2 (1%)/H2/Ar-rich plasmas
    Gordillo-Vázquez, FJ
    Albella, JM
    PLASMA SOURCES SCIENCE & TECHNOLOGY, 2004, 13 (01): : 50 - 57
  • [18] Electron cyclotron resonance plasma etching of GaSb in Cl2/BCl3/CH4/Ar/H2 at room temperature
    Langer, JP
    Dutta, PS
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 2003, 21 (04): : 1511 - 1512
  • [19] Observation of perturbations in the rovibronic transition probabilities for the (4d)r3Πg−, (4d) s3 Δg− → (2p) c3Πu± band systems of the H2 molecule
    S. A. Astashkevich
    B. P. Lavrov
    A. V. Modin
    I. S. Umrikhin
    Optics and Spectroscopy, 2007, 102 : 363 - 366
  • [20] TRANSITION-STATE CONTROL OF PRODUCT ROTATIONAL DISTRIBUTIONS IN H + RH-] H2 + R REACTIONS (RH = HCL, HBR, HI, CH4, C2H6, C3H8)
    VALENTINI, JJ
    AKER, PM
    GERMANN, GJ
    HUH, YD
    FARADAY DISCUSSIONS, 1991, 91 : 173 - 182