In situ synchrotron X-ray diffraction experiments on electrochemically deposited ZnO nanostructures

被引：13

作者：

Ingham, Bridget ^{[1
,2
]}

Illy, Benoit N. ^{[3
,4
]}

Toney, Michael F. ^{[2
]}

Howdyshell, Marci L. ^{[2
]}

Ryan, Mary P. ^{[3
,4
]}

机构：

[1] Ind Res Ltd, Lower Hutt, New Zealand

[2] Stanford Synchrotron Radiat Lab, Menlo Pk, CA 94025 USA

[3] Univ London Imperial Coll Sci Technol & Med, Dept Mat, London SW7 2AZ, England

[4] Univ London Imperial Coll Sci Technol & Med, London Ctr Nanotechnol, London SW7 2AZ, England

来源：

JOURNAL OF PHYSICAL CHEMISTRY C | 2008年 / 112卷 / 38期

关键词：

D O I：

10.1021/jp806184z

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

We present results of in situ synchrotron X-ray diffraction experiments on electrochemically formed ZnO nanostructured films during their growth on to Au substrates. This allows the evolution of texture to be monitored throughout the deposition process. The results are in good agreement with previous in situ X-ray absorption spectroscopy measurements of growth kinetics and indicate that strong preferred orientation, which is not evident from the microstructure, develops early in the growth process.

引用

页码：14863 / 14866

页数：4

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