Properties of NiO sputtered thin films and modeling of their sensing mechanism under formaldehyde atmospheres

被引:60
|
作者
Castro-Hurtado, I. [1 ,2 ]
Malagu, C. [3 ,4 ]
Morandi, S. [5 ,6 ]
Perez, N. [1 ,2 ]
Mandayo, G. G. [1 ,2 ]
Castano, E. [1 ,2 ]
机构
[1] Univ Navarra, CEIT, San Sebastian 20018, Spain
[2] Univ Navarra, Tecnun, San Sebastian 20018, Spain
[3] Univ Ferrara, Dept Phys, I-44100 Ferrara, Italy
[4] IDASC Ist Acust & Sensorist OM Corbino, Corbino, Italy
[5] Univ Turin, Dipartimento Chim, Ctr Excellence, I-10125 Turin, Italy
[6] Univ Turin, NIS, Ctr Excellence, I-10125 Turin, Italy
关键词
NiO; Surface barrier; Formaldehyde; Gas sensor; p-Type; GAS SENSOR; OPTICAL-PROPERTIES; OXYGEN; OXIDATION; BARRIER;
D O I
10.1016/j.actamat.2012.10.024
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
In this work the sensing mechanism of p-type semiconducting NiO thin films under the exposure to formaldehyde is explained. The influence of the sensing layer thickness and annealing treatment on the structural, optical and electrical properties of the samples is studied. The height of the potential barrier is estimated from temperature-stimulated conductance measurements. The potential barrier height is linked to oxygen ionosorption on the semiconductor surface. Furthermore, Fourier transform-IR analysis was carried out in order to determine the chemical reactions that govern the process of gas detection and the temperature range at which they occur. As a result of the study, it is possible to explain how the thickness and annealing treatment affect the sensing mechanism of the samples. (C) 2012 Acta Materialia Inc. Published by Elsevier Ltd. All rights reserved.
引用
收藏
页码:1146 / 1153
页数:8
相关论文
共 50 条
  • [31] Stress development in sputtered NiO thin films during heat treatment
    Brückner, W
    Kaltofen, R
    Thomas, J
    Hecker, M
    Uhlemann, M
    Oswald, S
    Elefant, D
    Schneider, CM
    JOURNAL OF APPLIED PHYSICS, 2003, 94 (08) : 4853 - 4858
  • [32] Sputtered nanocrystalline NiO thin films for very low ethanol detection
    Hotovy, I.
    Spiess, L.
    Predanocy, M.
    Rehacek, V.
    Racko, J.
    VACUUM, 2014, 107 : 129 - 131
  • [33] Temperature-dependent optical characteristics of sputtered NiO thin films
    Terlemezoglu, M.
    Surucu, O.
    Isik, M.
    Gasanly, N. M.
    Parlak, M.
    APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING, 2022, 128 (01):
  • [34] Nucleation, growth mechanism, and bifunctional electrochromic supercapacitive properties of NiO thin films
    Patil, Sushant B.
    Desarada, Sachin, V
    Teli, Aviraj M.
    Vallabhapurapu, Sreedevi
    Shin, Jae Cheol
    Sadale, Shivaji B.
    CERAMICS INTERNATIONAL, 2024, 50 (24) : 56109 - 56122
  • [35] Effect of laser irradiation on the tribological properties of RF-sputtered nickel oxide (NiO) thin films
    Itapu, Srikanth
    Borra, Vamsi
    Li, Frank X.
    Cortes, Pedro
    Kumar, Mohit Hemanth
    VACUUM, 2022, 205
  • [36] Effect of substrate bias voltage on the physical properties of dc reactive magnetron sputtered NiO thin films
    Reddy, A. Mallikarjuna
    Reddy, A. Sivasankar
    Reddy, P. Sreedhara
    MATERIALS CHEMISTRY AND PHYSICS, 2011, 125 (03) : 434 - 439
  • [37] Physical properties of sputtered molybdenum oxide thin films suitable for gas sensing applications
    Manno, D
    Di Giulio, M
    Serra, A
    Siciliano, T
    Micocci, G
    JOURNAL OF PHYSICS D-APPLIED PHYSICS, 2002, 35 (03) : 228 - 233
  • [38] Sensing mechanism of hydrogen gas sensor based on RF-sputtered ZnO thin films
    Al-Hardan, N. H.
    Abdullah, M. J.
    Aziz, A. Abdul
    INTERNATIONAL JOURNAL OF HYDROGEN ENERGY, 2010, 35 (09) : 4428 - 4434
  • [39] SWITCHING PROPERTIES OF NIO AND NIO(LI) THIN-FILMS
    FUSCHILLO, N
    LALEVIC, B
    LEUNG, B
    BULLETIN OF THE AMERICAN PHYSICAL SOCIETY, 1972, 17 (03): : 246 - +
  • [40] PROPERTIES OF RF SPUTTERED ZNO THIN FILMS UNDER DIFFERENT OXYGEN FLUX
    Guo, Z. S.
    ADVANCES IN HETEROGENEOUS MATERIAL MECHANICS 2011, 2011, : 222 - 225