Conduction mechanisms of epitaxial EuTiO3 thin films

被引:22
|
作者
Zhao, R. [1 ]
Li, W. W. [1 ]
Chen, L. [2 ]
Meng, Q. Q. [1 ]
Yang, J. [1 ]
Wang, H. [2 ]
Wang, Y. Q. [3 ]
Tang, R. J. [1 ]
Yang, H. [1 ]
机构
[1] Soochow Univ, Jiangsu Key Lab Thin Films, Sch Phys Sci & Technol, Suzhou 215006, Peoples R China
[2] Texas A&M Univ, Dept Elect & Comp Engn, College Stn, TX 77843 USA
[3] Los Alamos Natl Lab, Div Mat Sci & Technol, Los Alamos, NM 87545 USA
基金
美国国家科学基金会; 中国国家自然科学基金;
关键词
D O I
10.1063/1.4750073
中图分类号
O59 [应用物理学];
学科分类号
摘要
To investigate leakage current density versus electric field characteristics, epitaxial EuTiO3 thin films were deposited on (001) SrTiO3 substrates by pulsed laser deposition and were post-annealed in a reducing atmosphere. This investigation found that conduction mechanisms are strongly related to temperature and voltage polarity. It was determined that from 50 to 150 K, the dominant conduction mechanism was a space-charge-limited current under both negative and positive biases. From 200 to 300 K, the conduction mechanism shows Schottky emission and Fowler-Nordheim tunneling behaviors for the negative and positive biases, respectively. This work demonstrates that Eu3+ is one source of leakage current in EuTiO3 thin films. (C) 2012 American Institute of Physics. [http://dx.doi.org/10.1063/1.4750073]
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页数:4
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